Microcrystalline silicon carbide thin films grown by HWCVD at different filament temperatures and their application in n-i-p microcrystalline silicon solar cells

Tao Chen,Yuelong Huang,Haiyan Wang,Deren Yang,Arup Dasgupta,Reinhard Carius,Friedhelm Finger
DOI: https://doi.org/10.1016/j.tsf.2009.01.029
IF: 2.1
2009-01-01
Thin Solid Films
Abstract:To optimize the performance of microcrystalline silicon carbide (µc-SiC:H) window layers in n-i-p type microcrystalline silicon (µc-Si:H) solar cells, the influence of the rhenium filament temperature in the hot wire chemical vapor deposition process on the properties of µc-SiC:H films and corresponding solar cells were studied. The filament temperature TF has a strong effect on the structure and optical properties of µc-SiC:H films. Using these µc-SiC:H films prepared in the range of TF=1800–2000 °C as window layers in n-side illuminated µc-Si:H solar cells, cell efficiencies of above 8.0% were achieved with 1 µm thick µc-Si:H absorber layer and Ag back reflector.
What problem does this paper attempt to address?