Abstract:Microcrystalline silicon (μc-Si) thin films are widely used for silicon thin film solar cells, especially in the high performance tandem solar cells which comprise an amorphous silicon junction at the top and a μc-Si junction at the bottom. One of the major factors affecting the photovoltaic properties of μc-Si thin film solar cells of thin films is the quality of the μc-Si thin films. In this work, we investigated the effect of substrates on the crystallization characteristics and growth behaviors of μc-Si thin films grown by the plasma enhanced chemical vapor deposition method (PECVD), and found that substrates have a strong effect on the crystallization characteristics of μc-Si thin films. In addition, the growth rate of μc-Si thin films was also highly influenced by the substrates. Three types of substrates, quartz glass, single crystalline silicon and thermally oxidized single crystalline silicon, were used for growing μc-Si thin films from SiH4/H2 with a flow rate ratio 2:98 at different temperatures. Crystallization characteristics of these μc-Si thin films were studied by Raman scattering and X-ray diffraction techniques.

Microcrystalline SiGe Prepared by VHF-PECVD for Thin Film Solar Cells

Microcrystalline Silicon Thin Film Solar Cells with Microcrystalline Silicon Carbide Window Layers and Silicon Absorber Layers Both Prepared by Hot‐Wire CVD

Microcrystalline Silicon‐carbon Alloys As Anti‐reflection Window Layers in High Efficiency Thin Film Silicon Solar Cells

Microcrystalline silicon carbide window layers in thin film silicon solar cells

Fabrication of Microcrystalline Silicon Materials and Microcrystalline Silicon Solar Cells and Study on Their Properties

Control of crystalline volume fraction of μC-Si thin film using 40.68 MHz PECVD system for solar cell application

Microcrystalline silicon films and tandem solar cells prepared by triode PECVD

Single-chamber Deposition of Intrinsic Microcrystalline Silicon Thin Film and Its Application in Solar Cells

Microcrystalline silicon carbide thin films grown by HWCVD at different filament temperatures and their application in n-i-p microcrystalline silicon solar cells

A PRELIMINARY STUDY ON MICROCRYSTALLINE SILICON MATERIALS AND SOLAR CELLS FABRICATED BY VHF-PECVD

STUDY ON MICROCRYSTALLINE SILICON THIN FILM SOLAR CELLS ON FLEXIBLE SUBSTRATE

P Type Microcrystalline Film and Its Application to Amorphous Solar Cells on Flexible Substrate

Fabrication of Microcrystalline Silicon Films by VHF-PECVD and Their Microstructure Study

Development of microcrystalline silicon carbide window layers by hot-wire CVD and their applications in microcrystalline silicon thin film solar cells

Study on the Growth Mechanism and Microstructure of High Rate Growth Μc-Si:H Thin Films

Influence of Substrate on the Growth of Microcrystalline Silicon Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition

PROPERTIES OF PECVD SiNx FILM FOR SOLAR CELLS

Influence of Substrate Temperature on the Growth of Μc-Sige Thin Film

STUDY ON THE PROPERTIES OF p-type μc-SiC∶H THIN FILM AND APPLICATION ON SOLAR CELLS ON FLEXIBLE SUBSTRATE

Fabrication of High Voltage GaAs Micro-Solar Cell Arrays

Microcrystalline Silicon Materials and Solar Cells with High Deposition Rate