Investigation on the Structural Origin of N-Type Conductivity in Inn Films

H. Wang,D. S. Jiang,L. L. Wang,X. Sun,W. B. Liu,D. G. Zhao,J. J. Zhu,Z. S. Liu,Y. T. Wang,S. M. Zhang,H. Yang
DOI: https://doi.org/10.1088/0022-3727/41/13/135403
2008-01-01
Abstract:This work presents a study of the correlation between the electrical properties and the structural defects in nominally undoped InN films. It is found that the density of edge-type threading dislocations (TDs) considerably affects the electron concentration and mobility in InN films. The Hall-effect measured electron concentration increases, while the Hall mobility decreases with the increase in the edge-type TD density. With the combination of secondary ion mass spectrometry and positron annihilation analysis, we suggest that donor-type point defects at the edge-type TD lines may serve as dominant donors in InN films and affect the carrier mobility.
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