Infrared Analysis of Hole Properties of Mg-doped P-Type InN Films

Masayuki Fujiwara,Yoshihiro Ishitani,Xinqiang Wang,Song-Bek Che,Akihiko Yoshikawa
DOI: https://doi.org/10.1063/1.3006052
IF: 4
2008-01-01
Applied Physics Letters
Abstract:Mg-doped InN films grown by plasma-assisted molecular beam epitaxy were characterized by infrared reflectance. Signatures of p-type conductivity in the spectra were obtained in the same doping density range where the existence of net acceptors was found by electrolyte capacitance-voltage measurements. Numerical spectrum analysis, which takes into account the large broadening factor of the normal mode energies of longitudinal optical phonon–plasmon coupling yielded high hole densities in the range of (0.1–1.2)×1019 cm−3 and optical mobilities in the range of 25–70 cm2/V s.
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