The Study and Test Method of SRAM Conventional Static Characteristics in 65 Nm Process Technology

CHEN Fengjiao,JIAN Wenxiang,DONG Qing,YUAN Rui,LIN Yinyin
DOI: https://doi.org/10.3969/j.issn.1000-3819.2011.06.019
2011-01-01
Abstract:Process variations have induced growing influence on the SRAM performances in the technology of 65 nm and below.SRAM read and write noise margins can reflect the SRAM performances,which are crucial for estimating yield of SRAM arrays.A new test structure is employed to obtain the 65 nm SRAM read and write noise margins.The structure can measure the SRAM conventional static characteristics in standby,read and write modes,respectively.These characteristics are named SNM,RSNM,N-curve and WNM.To overcome the disadvantages of heavy workload and IR drop during test in previous methods,the new test structure exploits 4-terminal to wire out the SRAM internal nodes,and also a decoder is utilized to activate the particular SRAM cell for test.With these static characteristics,65 nm SRAM performance can be studied.The designed structure has been fabricated in SIMC 65 nm CMOS process,and the corresponding test data have been got.
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