Growth and band alignment of Bi2Se3 topological insulator on H-terminated Si(111) van der Waals surface

Handong Li,Lei Gao,Hui Li,Gaoyun Wang,Jiang Wu,Zhihua Zhou,Zhiming Wang
DOI: https://doi.org/10.48550/arXiv.1212.6807
2012-12-31
Materials Science
Abstract:The van der Waals epitaxy of single crystalline Bi2Se3 film was achieved on hydrogen passivated Si(111) (H:Si) substrate by physical vapor deposition. Valence band structures of Bi2Se3/H:Si heterojunction were investigated by X-ray Photoemission Spectroscopy and Ultraviolet Photoemission Spectroscopy. The measured Schottky barrier height at the Bi2Se3-H:Si interface was 0.31 eV. The findings pave the way for economically preparing heterojunctions and multilayers of layered compound families of topological insulators.
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