Electrical properties of a single Ni-contact SnO2 nanowire field-effect transistors

Chiu-Yen Wang,Fang-Chun Lu,Yu-Kai Wu
DOI: https://doi.org/10.1016/j.matlet.2021.130285
IF: 3
2021-11-01
Materials Letters
Abstract:<p>Single crystalline SnO<sub>2</sub> nanowires were grown using chemical vapor deposition (CVD) method and fabricated into a single-nanowire field-effect transistor (FET) with Ni contact electrodes by photolithography. Investigations show good field-effect electrical performance was achieved using the Ni-contact single-SnO<sub>2</sub> nanowire device. Field effect mobility, on/off ratio and carrier species were 73.3 ± 4.17 cm<sup>2</sup>/V-s (for 10 devices), ~10<sup>6</sup>, and electrons, respectively. Furthermore, a low barrier height of 45.6 meV between the Ni contact and as-grown SnO<sub>2</sub> nanowire was achieved based on temperature dependent current-voltage measurement. It is thought this low barrier height improved field-effect transistor performance making SnO<sub>2</sub> nanomaterial devices practicable.</p>
materials science, multidisciplinary,physics, applied
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