Photoelectric Characteristics of Single ZnO Nanowire Field Effect Transistor

Li Jinglei,Zheng Kaibo,Xing Xiaoyan,Sun Dalin,Chen Guorong
DOI: https://doi.org/10.13922/j.cnki.cjovst.2008.01.018
2008-01-01
Abstract:This text introduced a method of ZnO nanowire field effect transistor(FET) fabrication.Scanning electron microscopy(SEM) and X-ray diffraction(XRD) were used to characterize the morphology and microstructures of the as-obtained sample.The output and transfer characteristics were tested respectively.The slope of output characteristic was 2.53×10-7 A/V when Vgs was 0 V.The turn-on voltage was-16.2 V and the transconductance was 46.6 nS when Vds was 2 V.The carrier concentration of one-dimensional ZnO nanowire was 1.15×108 cm-1,the electronic mobility was 14.4 cm2/Vs and the conductivity was 0.26 Ω-1cm-1.The cut-off frequency was 1585 Hz;the capacitance between the drain electrode and the source electrode was 25.4 pF.We also analysised the photoelectricity sensitivity and the time response of the FET and explained the possible mechanism.
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