Fabrication and Optoelectronic Characterization of Suspended In2O3 Nanowire Transistors

Jiang Yi-yang,Chen Yan,Wang Xu-dong,Zhao Dong-yang,Lin Tie,Shen Hong,Meng Xiang-jian,Wang Lin,Wang Jian-lu
DOI: https://doi.org/10.37188/co.2020-0062
IF: 1.1
2021-01-01
Chinese Optics
Abstract:One-dimensional (1D) semiconductor nanowires have shown outstanding performance in nanoelectronics and nano-photonics. However, the electrical properties of the nanowire transistors are very sensitive to interactions between the nanowires and substrates. Optimizing the device structure can improve the electrical and photodetection performance of nanowire transistors. We report a suspended In2O3 nanowire transistor fabricated by one-step lithography, showing a high mobility of 54.6 cm(2) V-1 s(-1) and a low subthreshold swing of 241.5 mVdec(-1). As an ultraviolet photodetector, the phototransistor shows an extremely low dark current (similar to 10(-13) A) and a high responsivity of 1.6x10(5) A.W-1. This simple and effective method of suspending the channel material of a transistor can be widely used in manufacturing high-performance micronano devices.
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