One-Step Growth and Field Emission Properties of SnO<sub>2</sub>-Capped Silicon Nanowires: A Sn-Catalyzed Approach

Hang Chi,Hui-Chao Zhu,Hong-Jun Xu,Xu-Dong Shan,Zhi-Min Liao,Da-Peng Yu
DOI: https://doi.org/10.1021/jp810543f
2009-01-01
Abstract:SnO2-capped Si nanowires have been reproducibly fabricated via a simple one-step chemical vapor deposition (CVD) method, in a high yield and uniform distribution. The Sn-catalyzed reaction is determined by a process of combined vapor-liquid-solid (VLS) and oxide-assisted growth (OAG) mechanism. Detailed microstructures of the nanowires have been investigated using scanning electron microscopy (SEM), transmission electron microscopy (TEM), together with X-ray diffraction (XRD) analysis and Raman spectroscopy. Field emission (FE) measurements revealed that the SnO2-capped nanowire structure can significantly reduce the turn-on field value of silicon nanostructures to similar to 3.7 V/mu m and even lower. A dual-component model for the motion of electrons in the unique heterojunction architecture has been proposed, in comparison with the classical Fowler-Nordheim (FN) theory. Furthermore, adsorption effects have also been confirmed in the actual course of field emission, which can play an important role in the realization of field emission devices.
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