Abstract:A novel design of the gas inlet system in a diamond microwave plasma chemical vapor deposition growth chamber has been reported in this paper. The design is targeting for high-quality, high-speed, and high-efficiency diamond material fabrication. By introducing a gas inlet hole into the susceptor, we expand the ways of gas introduction for diamond growth. After extensive numerical and experimental investigation, we have found that the introduction of methane and doping gas inlet from the hole of below while the hydrogen from the top is feasible for realizing the target. The growth and doping species could be confined around the substrate, making efficient usage of the precursors. The plasma state change caused by the difference of the gas inlet modes has been ascribed to the resulted gas distribution in the chamber. The measured growth rate has been increased to 32 μm/h, which is 16 times higher than traditional gas inlet configuration. Meanwhile, a large improvement of the nitrogen doping concentration has been achieved. Besides, with the increase of growth rate and nitrogen incorporation efficiency, the crystal quality and surface morphology keep in an acceptable degree. In this mode, the dual gas flow system can perfectly solve the contradiction among the crystal quality, growth rate, and doping efficiency, commonly existing during the material fabrication process, the chamber contamination could be significantly suppressed due to the constrained distribution of methyl and doping species, making the fabrication cost much lower. The results of repetitive experiments indicate that other residual impurities present in the chamber of MPCVD could likely regulate the threshold concentration of nitrogen required for accelerating the growth rate during the nitrogen doped diamond growth, which have a significant effect on the diamond growth.

GAS-JET SYNTHESIS OF DIAMOND COATINGS ON SILICON SUBSTRATES FROM AN H2 + CH4 + Ar MIXTURE ACTIVATED IN A MICROWAVE DISCHARGE

Gas-jet MPCVD synthesis of diamond coatings on substrates of various materials

Effect of methane flow rate on gas-jet MPCVD diamond synthesis

Effective cooling of substrates with low thermal conductivity under conditions of gas-jet MPCVD diamond synthesis

Large Area Single-Crystal Diamond Synthesis by 915 MHz Microwave Plasma-Assisted Chemical Vapor Deposition

Diamond Films and Particles Growth in Hydrogen Microwave Plasma with Graphite Solid Precursor: Optical Emission Spectroscopy Study

Growth of single-crystal diamond by microwave plasma CVD with high precursor utilization using cyclic gas injection and control of carbonaceous species content with optical emission spectroscopy

An innovative gas inlet design in a microwave plasma chemical vapor deposition chamber for high-quality, high-speed, and high-efficiency diamond growth

Deposition of Microcrystalline Diamond Films in H2 Microwave Plasma with Graphite Powder As Hydrocarbon Precursor

Diamond Micropowder Synthesis Via Graphite Etching in a Microwave Hydrogen Plasma

Enhanced Growth Of High Quality Single Crystal Diamond By Microwave Plasma Assisted Chemical Vapor Deposition At High Gas Pressures

Synthesis Of Nano-Crystalline Diamond Film In Hot Filament Chemical Vapour Deposition By Adding Ar

Novel Diamond Films Synthesis Strategy: Methanol and Argon Atmosphere by Microwave Plasma CVD Method Without Hydrogen

Research on Excimer Laser Induced Chemical Vapor Deposition of Diamond Films

Heteroepitaxial diamond growth on 4H-SiC using microwave plasma chemical vapor deposition

Enhanced Nucleation and Growth of Diamond Film on Si by CVD Using a Chemical Precursor

Diamond Nucleation on Unscratched Silicon Substrates Coated with Various Non-Diamond Carbon Films by Microwave Plasma-Enhanced Chemical Vapor Deposition

Microcrystalline Diamond Films By Direct Ion Beam Deposition

Using a Laser Plasmatron to Synthesize Diamond Coatings on a Carbide Cutting Tool

A novel microwave plasma reactor with a unique structure for chemical vapor deposition of diamond films

Microwave Plasma-Assisted Chemical Vapor Deposition of Microcrystalline Diamond Films Via Graphite Etching under Different Hydrogen Flow Rates