Structural characterization of Mo/Si multilayer by grazing incidence X-ray diffraction

Yu Bo

Abstract:In order to characterize the structure of a Mo/Si multilayer,the Small Angle X-ray Diffraction(SAXD) of a multilayer sample is measured and the analytical methods of SAXD data were introduced,including Bragg peak fitting,Fourier transform,and X-ray diffraction fitting.The period thickness of the multilayer obtained by the Bragg peak fitting or X-ray diffraction curve fitting is 7.09 nm.The interface roughness(interdiffusion length) are 0.40-0.41 nm(Si on Mo) and 0.52-0.70 nm(Mo on Si),respectively.And the former is smaller than latter,which is consistent with the Transmisson Electron Microscopy(TEM) results in 0.40 nm(Si on Mo) and 0.6-0.65 nm(Mo on Si).Meanwhile,the refractive profile extracted by the X-ray diffraction fitting with a diffusion model is also consistent with the gray-scale profile by integrated High Resolution TEM(HRTEM).By the comprehensive characterization of the X-ray diffractometry(XRD) and TEM,the fine structural information of the Mo/Si multilayer is obtained,which is critical for the technology optimization of the multilayer deposition.

Materials Science,Physics