Abstract:Mo disulfide overlayers with the thickness exceeding 1.77 nm were obtained on Si substrates through mechanical exfoliation. The resulting Mo disulfide flakes were then analyzed ex situ using combination of Auger electron spectroscopy (AES), elastic-peak electron spectroscopy (EPES) and scanning electron microscopy (SEM) in order to characterize their surface chemical composition, electron transport phenomena and surface morphology. Prior to EPES measurements, the Mo disulfide surface was sputter-cleaned and amorphized by 3 kV argon ions, and the resulting S/Mo atomic ratio varied in the range 1.80–1.88, as found from AES measurements. The SEM images revealed single crystalline small-area (up to 15 μm in lateral size) Mo disulfide flakes having polygonal or near-triangular shapes. Such irregular-edged flakes exhibited high crystal quality and thickness uniformity. The inelastic mean free path (IMFP), characterizing electron transport, was evaluated from the relative EPES using Au reference material for electron energies E = 0.5–2 keV. Experimental IMFPs, λ, determined for the AES-measured surface compositions were approximated by the simple function λ = kEp, where k = 0.0289 and p = 0.946 were fitted parameters. Additionally, these IMFPs were compared with IMFPs resulting from the two methods: (i) present calculations based on the formalism of the Oswald et al. model; (ii) the predictive equation of Tanuma et al. (TPP-2M) for the measured Mo0.293S0.551C0.156 surface composition (S/Mo = 1.88), and also for stoichiometric MoS2 composition. The fitted function was found to be reasonably consistent with the measured, calculated and predicted IMFPs. We concluded that the measured IMFP value at 0.5 keV was only slightly affected by residual carbon contamination at the Mo disulfide surface.

Structural Studies Of Mo/Si Multilayers By Exafs

XAFS Study on the Microstructure of Mo/Si Multilayers

Interlayer Microstructure of Sputtered Mo/Si Multilayers

Structural characterization of Mo/Si multilayer by grazing incidence X-ray diffraction

Analysis of periodic Mo/Si multilayers: influence of the Mo thickness

Nano-size crystallites in Mo/Si multilayer optics

Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers

The structure, diffusion and phase formation in Mo/Si multilayers with stressed Mo layers

Comparative Study on Microstructure of Mo/Si Multilayers Deposited on Large Curved Mirror with and without the Shadow Mask

Periodic Structure and Quantum Size Effect of μc-Si∶H/a-Si∶H Multilayers

Asymmetric Interface and Growth Mechanism in Sputtered W/Si and WSi2/Si Multilayers

X-ray Diffraction Studies of Trilayer Oscillations in the Preferred Thickness of in Films on Si(111)

Characterization of ultra smooth interfaces in Mo/Si-multilayers

Surface Characterization of MoS2 Atomic Layers Mechanically Exfoliated on a Si Substrate

Stress relaxation in Mo/Si multilayer structures

Microstructure Evolution in Magnetron-Sputtered WC/SiC Multilayers with Varied WC Layer Thicknesses

Structural and residual stress changes in Mo/a-Si multilayer thin films with annealing

Spectroscopic Ellipsometry Investigation of Au-Assisted Exfoliated Large-Area Single-Crystalline Monolayer MoS2

Silicide layer growth rates in Mo/Si multilayers

Structural study of sputtered Pd/Si multilayers

Unraveling the interlayer and intralayer coupling in two-dimensional layered MoS$_2$ by X-ray absorption spectroscopy and ab initio molecular dynamics simulations