Improvement of characteristics of NbO2 selector and full integration of 4F2 2x-nm tech 1S1R ReRAM

Soo Gil Kim,Tae Jung Ha,Seonghyun Kim,Jae Yeon Lee,Kyung Wan Kim,Jung Ho Shin,Yong Taek Park,Suk Pyo Song,Beom Yong Kim,Wan Gee Kim,Jong Chul Lee,Hyun Sun Lee,Jong Ho Song,Eung Rim Hwang,Sang Hoon Cho,Ja Chun Ku,Jong Il Kim,Kyu Sung Kim,Jong Hee Yoo,Hyo Jin Kim,Hoe Gwon Jung,Kee Jeung Lee,Suock Chung,Jong Ho Kang,Jung Hoon Lee,Hyeong Soo Kim,Sung Joo Hong,Gary Gibson,Yoocharn Jean,Yoocharn Jeon
DOI: https://doi.org/10.1109/iedm.2015.7409668
2015-12-01
Abstract:In this paper, the authors report that 2x nm cross-point ReRAM with 1S1R structure has been successfully developed. Off-current at 1/2 Vsw of 1S1R is one of key factor for high-density ReRAM. NbO2 was chosen as a selector material and off-current and forming characteristics were improved by using stack engineering of top and bottom barriers as well as spacer materials. Finally array operation was characterized with the integration of selector and resistor materials.
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