Rectifying Characteristics and Implementation of N-Si/hfo2 Based Devices for 1D1r-Based Cross-Bar Memory Array

Zhang, F.F.,Huang, P.,Chen, B.,Yu, D.
DOI: https://doi.org/10.1109/snw.2012.6243357
2012-01-01
Abstract:Excellent rectifying characteristics are demonstrated in the fab-friendly n-Si/HfO2/Ni/TiN devices with rectification ratio of >;107 and the driving current of 1mA as a 1D-like selector. The rectified unipolar switching behaviors are demonstrated in the 1D1R cell structured with a diode-like device of n-Si/HfO2/Ni/TiN (1D) and a unipolar RRAM of n+-Si/HfOx/Ni/TiN (1R). Based on the measured I-V characteristics, these excellent selection behavior can be implemented in the cross-bar memory array of >;64K bits RRAM with large read margin.
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