Novel Vertical 3D Structure of TaO X -Based RRAM with Self-localized Switching Region by Sidewall Electrode Oxidation
Muxi Yu,Yimao Cai,Zongwei Wang,Yichen Fang,Yefan Liu,Zhizhen Yu,Yue Pan,Zhenxing Zhang,Jing Tan,Xue Yang,Ming Li,Ru Huang
DOI: https://doi.org/10.1038/srep21020
IF: 4.6
2016-01-01
Scientific Reports
Abstract:A novel vertical 3D RRAM structure with greatly improved reliability behavior is proposed and experimentally demonstrated through basically compatible process featuring self-localized switching region by sidewall electrode oxidation. Compared with the conventional structure, due to the effective confinement of the switching region, the newly-proposed structure shows about two orders higher endurance (>10 8 without verification operation) and better retention (>180h@150 °C), as well as high uniformity. Corresponding model is put forward, on the base of which thorough theoretical analysis and calculations are conducted as well, demonstrating that, resulting from the physically-isolated switching from neighboring cells, the proposed structure exhibits dramatically improved reliability due to effective suppression of thermal effects and oxygen vacancies diffusion interference, indicating that this novel structure is very promising for future high density 3D RRAM application.