Nb1-xO2 Based Universal Selector with Ultra-high Endurance (>1012), High Speed (10ns) and Excellent Vth Stability

Qing Luo,Jie Yu,Xumeng Zhang,Kan-Hao Xue,Jun-Hui Yuan,Yan Cheng,Tiancheng Gong,Hangbing Lv,Xiaoxin Xu,Peng Yuan,Jiahao Yin,Lu Tai,Shibing Long,Qi Liu,Xiangshui Miao,Jing Li,Ming Liu
DOI: https://doi.org/10.23919/vlsit.2019.8776546
2019-01-01
Abstract:In this work, we demonstrate a high performance Nb 1-x O 2 based selector with thermal feedback mechanism for 3D X-point application. Ultra-high endurance , high operation speed (10ns), bidirectional operation and excellent V th stability were achieved. By adding a barrier layer between Nb 1-x O 2 film and electrode, the off-state leakage current was reduced by one order of magnitude (selectivity as high as 500). This work provides a universal selector solution for various emerging memories, including RRAM, MRAM and PCM.
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