High-k erbium oxide film prepared by sol-gel method for low-voltage thin-film transistor

Guandong Wang,Daiming Liu,Shuangqing Fan,Zhaoyang Li,Jie Su
DOI: https://doi.org/10.1088/1361-6528/abe439
IF: 3.5
2021-03-03
Nanotechnology
Abstract:Abstract In this work, high-dielectric-constant (high- k ) erbium oxide(Er 2 O 3 )film is fabricated using the spin coating method, and annealed at a series of temperatures (from 400 °C to 700 °C). The effect of annealing temperature on the microstructural and electrical properties of Er 2 O 3 nanofilm is investigated. To demonstrate the applicability of the Er 2 O 3 film, the indium oxide (In 2 O 3 ) thin film transistor (TFT)-based amorphous Er 2 O 3 dielectric film is fabricated at different temperatures. The TFT-based EO-600 shows a low-operating voltage and good electrical properties. The inverter demonstrates that the Er 2 O 3 nanofilm synthesized by the sol-gel method could be a promising candidate as the dielectric layer in a low-voltage electronic device.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
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