Transistor noise in SiGe HBT RF technology

Guofu Niu,Zhenrong Jin,John D. Cressler,Rao Rapeta,Alvin J. Joseph,David Harame,G. Niu,Z. Jin,J.D. Cressler,R. Rapeta,A.J. Joseph,D. Harame
DOI: https://doi.org/10.1109/4.944672
2001-01-01
Abstract:This brief presents experimental and modeling results of device noise in SiGe HBT RF technology. By careful bandgap engineering, a simultaneous reduction of RF noise, $1/f$ noise, and phase noise has been achieved. At a given $I_B$, transistors with different base bandgap profiles show similar $1/f$ noise. At a given $I_C$, however, transistors with a higher $\beta$ (and hence lower RF noise) show lower $1/f$ noise. Circuit analysis and simulation shows that the phase noise is reduced as well.
engineering, electrical & electronic
What problem does this paper attempt to address?