Abstract:Photonic integrated circuits based on Lithium Niobate have demonstrated the vast capabilities afforded by material with a high Pockels coefficient, allowing linear and high-speed modulators operating at CMOS voltage levels for applications ranging from data-center communications and photonic accelerators for AI. However despite major progress, the industrial adoption of this technology is compounded by the high cost per wafer. Here we overcome this challenge and demonstrate a photonic platform that satisfies the dichotomy of allowing scalable manufacturing at low cost, while at the same time exhibiting equal, and superior properties to those of Lithium Niobate. We demonstrate that it is possible to manufacture low loss photonic integrated circuits using Lithium Tantalate, a material that is already commercially adopted for acoustic filters in 5G and 6G. We show that LiTaO3 posses equally attractive optical properties and can be etched with high precision and negligible residues using DUV lithography, diamond like carbon (DLC) as a hard mask and alkaline wet etching. Using this approach we demonstrate microresonators with an intrinsic cavity linewidth of 26.8 MHz, corresponding to a linear loss of 5.6 dB/m and demonstrate a Mach Zehnder modulator with Vpi L = 4.2 V cm half-wave voltage length product. In comparison to Lithium Niobate, the photonic integrated circuits based on LiTaO3 exhibit a much lower birefringence, allowing high-density circuits and broadband operation over all telecommunication bands (O to L band), exhibit higher photorefractive damage threshold, and lower microwave loss tangent. Moreover, we show that the platform supports generation of soliton microcombs in X-Cut LiTaO3 racetrack microresonator with electronically detectable repetition rate, i.e. 30.1 GHz.

Fabrication of Ultra-High-q Ta2O5 Microdisks by Photolithography-Assisted Chemo-Mechanical Etching

Fabrication of high-Q microresonators in dielectric materials using a femtosecond laser: Principle and applications

Fabrication of Optical Cavities with Femtosecond Laser Pulses

Fabrication of Microresonators of High Q/V Ratios Using Femtosecond Laser Micromachining

Ultra-high-Q Microcavities Fabricated on Fused Silica Chips by Three-Dimensional Femtosecond Laser Microfabrication

Femtosecond Laser Direct Writing of High-Q Microresonators in Glass and Crystals

Ultra-high Q lithium niobate microring monolithically fabricated by photolithography assisted chemo-mechanical etching

Athermal high-Q tantalum-pentoxide-based microresonators on silicon substrates

Fabrication of Ultra-High Q Silica Microdisk Using Chemo-Mechanical Polishing

High-Extraction-Rate Ta2O5-Core/SiO2-Clad Photonic Waveguides on Silicon Fabricated by Photolithography-Assisted Chemo-Mechanical Etching (PLACE)

High-Q and highly reproducible microdisks and microlasers.

Nonlinear and low-loss tantalum pentoxide based micro-ring resonator by ion-assisted electron-beam deposition

Engineering high-Q superconducting tantalum microwave coplanar waveguide resonators for compact coherent quantum circuits

Tantalum Microwave Resonators with Ultra-High Intrinsic Quality Factors

Lithium tantalate electro-optical photonic integrated circuits for high volume manufacturing

High Optical Damage Threshold On-Chip Lithium Tantalate Microdisk Resonator.

Fabrication of high quality factor lithium niobate double-disk using a femtosecond laser

High-quality-factor Optical Microresonators Fabricated on Lithium Niobate Thin Film with an Electro-Optical Tuning Range Spanning over One Free Spectral Range [Invited]

Fabrication of SiO2 Microdisk Optical Resonator

Tunable and stable micro-ring resonator based on thin-film lithium tantalate

High-Q Tantalum Oxide Nanomechanical Resonators by Laser-Oxidation of TaSe2