Al0.1Ga0.9N P-I-n Ultraviolet Avalanche Photodiodes with Avalanche Gain over 106

Haifan You,Haiping Wang,Weike Luo,Yiwang Wang,Xinghua Liu,Zhenguang Shao,Dunjun Chen,Hai Lu,Rong Zhang,Youdou Zheng
DOI: https://doi.org/10.1109/led.2022.3193755
IF: 4.8157
2022-01-01
IEEE Electron Device Letters
Abstract:We report Al0.1Ga0.9N p-i-n ultraviolet (UV) avalanche photodiodes (APDs) based on sapphire substrates with a record-high gain over $2 \times 10^{6}$ . The devices fabricated with various mesa diameters present consistent avalanche behaviors and identical dark current distributions over multiple ${I}-{V}$ scans, which are comparable to the GaN APDs grown on free-standing GaN substrates. The quadratic fitting of the dark currents versus the mesa sizes reveals that the leakage current at the breakdown voltage is a mixture of surface leakage and bulk leakage, and the surface component is comparable to that of the bulk. Additionally, KOH surface treatment and SiO2 passivation are proven to be very effective in suppressing the leakage current and achieving robust avalanche performance.
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