Abstract:A solute-solvent separation soft lithography (3S soft lithography) is reported in this paper, which aims at offering a residual-layer-free micromachining technique that can be realized in an ordinary laboratory conveniently. In 3S soft lithography, a polydimethylsiloxane (PDMS) block containing micro-structure relief serves as the stamp, and the resist (as the solute) is dissolved in a solvent to form a solution before being molded by the stamp. During the molding process, the stamp absorbs the solvent and filters the resist; as a result, the resist can solidify on the substrate and replicate the pattern on the stamp. To improve the global geometric uniformity of the duplicated pattern, a hybrid PDMS stamp whose effectiveness is verified by the finite element analysis is used. Moreover, the liquid bridge phenomenon is creatively applied to remove the bubble defects caused during the molding process. The pattern transfer fidelity of 3S soft lithography is analyzed, and some suggestions are summarized for performing a high quality 3S soft lithography based on the experimental results. Verified by our experiment, the micro-structure fabricated by 3S soft lithography can serve as a mask for the following etching, and a lattice with minimum line width of 200 nm has been successfully fabricated on the silicon wafer in our study.

An HF-Free Etching of SiO2for Soft Lithography

An HF-Free Etching of SiO 2 for Soft Lithography

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Fabrication of Sub-10 Nm Planar Nanofluidic Channels Through Native Oxide Etch and Anodic Wafer Bonding

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Study on HF Vapor-Phase Etching for Suspended Nano Structure Fabrication

Understanding the effect of HF-based wet shallow etching on optical performance of reactive-ion-etched fused silica optics

The experimental study and analysis of the etching for SiO2 sacrificial layer

Mechanistic Study of the Nanoscale Negative-Tone Pattern Transfer from Dna Nanostructures to Sio2

Dry Etching of HfO2 and SiO2 Optical Thin Films

Optimization of Metal-Assisted Etchant Components for Fabrication of Porous Silicon

Innovatively Composite Hard Mask to Feature Sub-30 Nm Gate Patterning

Studies on the Interfacial Etching Reaction of Development-Free Vapor Photolithography

Anisotropic Vapor HF etching of silicon dioxide for Si microstructure release

The Role of Sulfite in the Wetting Etching of Silicon and Silica

SiO_2/Si Dry Etching with XeF_2

A simple and residual-layer-free solute–solvent separation soft lithography method