Abstract:Two potential strategies for chemically patterning alkyne-terminated self-assembled monolayers (SAMs) on oxide-free silicon or silicon-on-sapphire (SOS) substrates were investigated and compared. The patterned surfaces were validated using a light-addressable potentiometric sensor (LAPS) for the first time. The first strategy involved an integration of photolithography with "click" chemistry. Detailed surface characterization (i.e. water contact angle, ellipsometry, AFM, and XPS) and LAPS measurements showed that photoresist processing not only decreases the coverage of organic monolayers but also introduces chemically bonded contaminants on the surfaces, thus significantly reducing the quality of the SAMs and the utility of "click" surface modification. The formation of chemical contaminants in photolithography was also observed on carboxylic acid- and alkyl-terminated monolayers using LAPS. In contrast, a second approach combined microcontact printing (μCP) with "click" chemistry; that is azide (azido-oligo(ethylene glycol) (OEG)-NH2) inks were printed on alkyne-terminated SAMs on silicon or SOS through PDMS stamps. The surface characterization results for the sample printed with a flat featureless PDMS stamp demonstrated a nondestructive and efficient method of μCP to perform "click" reactions on alkyne-terminated, oxide-free silicon surfaces for the first time. For the sample printed with a featured PDMS stamp, LAPS imaging showed a good agreement with the pattern of the PDMS stamp, indicating the successful chemical patterning on non-oxidized silicon and SOS substrates and the capability of LAPS to image the molecular patterns with high sensitivity.

In-situ negatively nanopatterning alkylated silicon (111) surface by conductive atomic force microscope.

Reversible Nanopatterning on Self-Assembled Monolayers on Gold

Direct Patterning of Negative Nanostructures on Self-Assembled Monolayers of 16-Mercaptohexadecanoic Acid on Au(111) Substrate Via Dip-Pen Nanolithography

Microfabrication of Silicon Using Self-Assembled Monolayer Resist and Metastable Helium Beam

Electrically Biased Nanolithography with Koh-Coated Afm Tips

Self-assembled Monolayer-Assisted Negative Lithography.

The Improved Self-assembled Monolayer of Octadecyltrichlorosilane As Positive Resist for Patterning Silicon Surface by Metastable Helium Atom Beam Lithography

Silicon Micro/Nanofabrication Using Metastable Helium Atom Beam Lithography

Metastable helium atom beam lithography with octadecyltrichlorosilane self-assembled monolayer resister grown directly on silicon surface

AFM Tip-Based Fabrication of Silicon Nanostructures with Reduced Subsurface Amorphous Layers

Fabrication of Nanoparticle Pattern Through Atomic Force Microscopy Tip-Induced Deposition on Modified Silicon Surfaces

Constructive Nanolithography by Chemically Modified Tips: Nanoelectrochemical Patterning on Sams/Au

Conductive Afm Patterning On Oligo(Ethylene Glycol)-Terminated Alkyl Monolayers On Silicon Substrates: Proposed Mechanism And Fabrication Of Avidin Patterns

Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

A Novel Nanolithography Technique for Self-Assembled Monolayers Using a Current Sensing Atomic Force Microscope

Bottom-up Nanofabrication Through Catalyzed Vapor Phase HF Etching of SiO2

Patterning of Silicon Substrate with Self-Assembled Monolayers Using Vertically Aligned Carbon Nanotube Electron Sources

Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

A New Method to Pattern Silicon Surface with Chemical Functional Groups

"Click" Patterning of Self-Assembled Monolayers on Hydrogen-Terminated Silicon Surfaces and Their Characterization Using Light-Addressable Potentiometric Sensors.

Selective Functionalization of Silicon Surface Controlled by Metastable Helium Atom Beam for Patterning Chemisorbed Monolayer Molecular Assemblies