Abstract:Electron irradiation of self-assembled monolayers (SAMs) is a versatile tool for a variety of lithographic methods and formation of new 2D materials such as carbon nanomembranes (CNMs) with potential application in ultrafiltration. While the interaction between the electron beam and standard aromatic or aliphatic thiolate SAMs on gold has been well studied, the behavior of more complex systems such as N-heterocyclic carbenes (NHCs), which are recently attracting growing attention due to their ultra-high chemical and thermal stability, remains completely unknown. In the current work, we analyze the low-energy electron irradiation of SAMs on gold based on the series of NHC molecules featuring different number of benzene moieties (0, 1 and 2), and different size of the nitrogen side groups (methyl, isopropyl) to modify their packing density. The changes in monolayer thickness and composition are carefully analyzed by the X-ray photoelectron spectroscopy (XPS) as a function of electron dose. Our results provide design rules to optimize NHC SAMs structure for their effective modification by the electron irradiation. Such optimization becomes particularly interesting considering that the analyzed NHC monolayers exhibit a much higher stability of their bonding with the metal substrate towards electron irradiation compared to standard thiols or recently applied carboxylic acids. Thus, the NHC SAMs offer an interesting alternative for chemical lithography where structural modification of SAMs by electron or photon beams should be limited mainly to the functional group. Moreover, delamination and transferring of electron irradiated NHC monolayers on holey TEM grid reveals formation of carbon nanomembranes (CNMs). As we show this process is also very sensitive to the structure of NHC SAMs and for properly designed system enables formation of continuous, freestanding CNMs, which are sulfur free and thus much more suitable for some ultrafiltration applications compared to standard CNMs fabricated from thiols and therefore contaminated with reactive sulfur.

A Novel Nanolithography Technique for Self-Assembled Monolayers Using a Current Sensing Atomic Force Microscope

Formation of Nanopatterns of a Self-Assembled Monolayer (SAM) Within a SAM of Different Molecules Using a Current Sensing Atomic Force Microscope

Patterning of Supported Gold Monolayers Via Chemical Lift-off Lithography

Electrochemical Studies on Self-Assembled Monolayer (sam) Upon Exposure to Anionic Surfactants: Pfoa, Pfos, Sds and Sdbs

AFM-Assisted Fabrication of Thiol SAM Pattern with Alternating Quantified Surface Potential

Photopatterning of self-assembled monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

In situ differential atomic force microscopy (AFM) measurement for ultra-thin Thiol SAM patterns by area-selective deposition technique

Generation of Nanostructures by Scanning Near-Field Photolithography of Self-Assembled Monolayers and Wet Chemical Etching

A Novel Self-Assembled Monolayer (SAM) Coated Microcantilever for Low Level Caesium Detection

Applications of Scanning Probe Microscopy in Nanolithography on Alkanethiol Self-Assembled Monolayers

The nature of alkanethiol self-assembled monolayer adsorption on sputtered gold substrates

Patterning Of Self-Assembled Monolayers By Phase-Shifting Mask And Its Applications In Large-Scale Assembly Of Nanowires

"Click" Patterning of Self-Assembled Monolayers on Hydrogen-Terminated Silicon Surfaces and Their Characterization Using Light-Addressable Potentiometric Sensors.

Electron Beam Induced Modification of N-Heterocyclic Carbenes – Carbon Nanomembrane Formation

Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

STM Imaging Mechanism for Alkanethiol Self-Assembly Monolayers on Au(111)

Molecular Patterning and Directed Self-Assembly of Gold Nanoparticles on GaAs

Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS) Profiling of Self Assembled Monolayer (SAM) Patterns Based on Vapor Deposition Technique

Colloidal monolayer at the air/water interface: Large-area self-assembly and in-situ annealing

Fabrication of Patterned Self-Assembled Monolayers on Silicon Substrate

Simple and Rapid Monolayer Self-Assembly of Nanoparticles at the Air/Water Interface