Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Generation of Nanostructures by Scanning Near-Field Photolithography of Self-Assembled Monolayers and Wet Chemical Etching

Fabrication of Sub-Diffraction-limit Molecular Structures by Scanning Near-Field Photolithography

Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

Photopatterning of self-assembled monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenylsiloxane monolayers.

Matching the Resolution of Electron Beam Lithography by Scanning Near-Field Photolithography

Direct Writing Nanostructures on Au Nano-Film by Laser Irradiating Cantilevered Scanning Near-Field Optical Microscope Tip

Dna Nanofabrication By Scanning Near-Field Photolithography Of Oligo (Ethylene Glycol) Terminated Sams: Controlled Scan-Rate Dependent Switching Between Head Group Oxidation And Tail Group Degradation

Fabrication of sub-50 nm solid-state nanostructures based on nanolithography

A Novel Pmma/Neb Bilayer Process for Sub-20 Nm Gold Nanoslits by A Selective Electron Beam Lithography and Dry Etch

Applications of Scanning Probe Microscopy in Nanolithography on Alkanethiol Self-Assembled Monolayers

Self-assembled Monolayer-Assisted Negative Lithography.

A Novel Nanolithography Technique for Self-Assembled Monolayers Using a Current Sensing Atomic Force Microscope

Unconventional Lithography for Patterned Nanomaterials

Desktop Nanofabrication with Massively Multiplexed Beam Pen Lithography

Fabrication of Gold Micro- and Nanostructures by Photolithographic Exposure of Thiol-Stabilized Gold Nanoparticles

Micro/Nanoscale Structure Fabrication by Direct Nanoimprinting of Metallic and Semiconducting Nanoparticles

Surface Nanostructuring by Nano-/Femtosecond Laser-Assisted Scanning Force Microscopy

Gold Nanoparticle Patterning of Silicon Wafers Using Chemical E-Beam Lithography.

Method for Fabricating Micro/Nanostructures Via Scanning Probe Microscope and Anisotropic Wet Etching

SPM-based Nanofabrication Using a Synchronization Technique