Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

ZC Chen,JW Zheng,ZF Liu
DOI: https://doi.org/10.3866/pku.whxb20011002
2001-01-01
Abstract:Using gold nanoparticle as nanooxidation mask, tapping mode atomic force microscope (TM-AFM) nanolithography and wet chemical etching techniques were combined to build nanostructure on Si surface. The nanoparticles were immobilized on mercaptopropyl-trimethoxysilane (MPTS)-modified silicon surface via Au - S bonding and were exploited as the lithography mask to prevent the AFM tip-induced nanooxidation of MPTS and silicon substrate. It was found that the nanostructures formed on Si surface were dependent on the tip-sample separation. With a certain bias voltage, scanning rate and relative humidity, adjusting the separation to 7.5 nm, nanopillar structures were obtained; while decreasing the separation to 5 nm, nano-ring structures appeared. To explain the formation mechanism of these nanostructures, a hard ball model based on nanoparticle physical shielding effect was proposed.
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