Abstract:The atomic force microscope (AFM) can be used in dynamic tipping mode as an effective lithography technique capable of manufacturing nanometer sized devices on the surface of a silicon wafer with a higher resolution surface characterization. The most difficult challenge in fabrication of nanostructure based on AFM nano-oxidation approach is the way of controlling an electric field between a cantilever probe tip and a silicon wafer. A water bridge builds up between the tip and the wafer, resulting in the oxidation due to the high electric field in the region. A reconstructive AFM system for nano-oxidation with a tapping model, implemented in an air, was developed. The presented AFM implements the increasing of electric field intensity by analyzing the impact voltage from −1 V to −5 V, electric field, and ion concentrations at the ambient/oxide and oxide/silicon interfaces, while the growth of thin oxides assumes a single liquid/silicon interface, which is modeled as an infinitely long conducting plane. Therefore, particle distribution for the surface charge density is generated for topography simulations. Based on the control-parameters, an enhanced electrical field of up to 1010 V/m can be obtained, which provides a powerful support for controllable experimental study of nanostructures fabrication with AFM tip induced local anodic oxidation. This showed the dependence of applied voltage types and various nanostructures and life time of AFM tip, by controlling tip-sample position in nanolithography processes is an important factor for controlling the aspect electric field distribution. And the effect of different parameters on enhancement distribution was performed and analyzed in this paper.

Fabrication of Nanostructures on the Surface of Titanium Film Using SPM Nanolithograpy Technique

Local Oxidation of Titanium Thin Films Using an Atomic Force Microscope under Static and Pulsed Voltages

Nano-fabrication System Based on Atomic Force Microscopy

Mechanical Writing of N-Type Conductive Layers on the SrTiO3 Surface in Nanoscale

AFM Tip-Based Fabrication of Silicon Nanostructures with Reduced Subsurface Amorphous Layers

Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

SPM-based Nanofabrication Using a Synchronization Technique

Fabricating Artificial Nanostructures with a Scanning Tunneling Microscope

Tunable Growth of TiO2 Nanostructures on Ti Substrates

Nanolithography by non-contact AFM induced local oxidation : Fabrication of tunneling barriers suitable for single electron devices

Fabrication of Hierarchical Micro/nanostructures on Titanium Alloy by Combining Rotary Ultrasonic Milling and Anodizing

3-D finite element calculation of electric field enhancement for nanostructures fabrication mechanism on silicon surface with AFM tip induced local anodic oxidation

Study on the Delicate Nanostructures Formed on Au(111) by Scanning Tunneling Microscopy (STM)

Fabrication of Gold Nanostructures on Graphite Using Atomic Force Microscope

Fabrication Of Nanostructured Titania Thin Film At Low Temperature

Improving the Resolution and the Uniformity of AFM Tip Induced Oxide Patterns with Pulsed Voltages

Fabrication and investigation of nanostructures on transition metal dichalcogenide surfaces using a scanning tunneling microscope.

Fabrication and properties of TiO2 nanofilms on different substrates by a novel and universal method of Ti-ion implantation and subsequent annealing

Fabrication of nanoscale to microscale 2.5D square patterns on metallic films by the coupling AFM lithography

TiO2 micro-devices fabricated by laser direct writing.

Fabrication Techniques of Nano-Structure