Abstract:The atomic force microscope (AFM) can be used in dynamic tipping mode as an effective lithography technique capable of manufacturing nanometer sized devices on the surface of a silicon wafer with a higher resolution surface characterization. The most difficult challenge in fabrication of nanostructure based on AFM nano-oxidation approach is the way of controlling an electric field between a cantilever probe tip and a silicon wafer. A water bridge builds up between the tip and the wafer, resulting in the oxidation due to the high electric field in the region. A reconstructive AFM system for nano-oxidation with a tapping model, implemented in an air, was developed. The presented AFM implements the increasing of electric field intensity by analyzing the impact voltage from −1 V to −5 V, electric field, and ion concentrations at the ambient/oxide and oxide/silicon interfaces, while the growth of thin oxides assumes a single liquid/silicon interface, which is modeled as an infinitely long conducting plane. Therefore, particle distribution for the surface charge density is generated for topography simulations. Based on the control-parameters, an enhanced electrical field of up to 1010 V/m can be obtained, which provides a powerful support for controllable experimental study of nanostructures fabrication with AFM tip induced local anodic oxidation. This showed the dependence of applied voltage types and various nanostructures and life time of AFM tip, by controlling tip-sample position in nanolithography processes is an important factor for controlling the aspect electric field distribution. And the effect of different parameters on enhancement distribution was performed and analyzed in this paper.

Nanolithography by non-contact AFM induced local oxidation : Fabrication of tunneling barriers suitable for single electron devices

3-D finite element calculation of electric field enhancement for nanostructures fabrication mechanism on silicon surface with AFM tip induced local anodic oxidation

Self-aligned Electrodes for Suspended Carbon Nanotube Structures

AFM local oxidation nanolithography of graphene

Nanoscale control of LaAlO3/SrTiO3 metal-insulator transition using ultra-low-voltage electron-beam lithography

Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system

Mechanical Writing of N-Type Conductive Layers on the SrTiO3 Surface in Nanoscale

Detection of confined current paths on oxide surfaces by local-conductivity atomic force microscopy with atomic resolution

Electrokinetics In Micro-Channeled Cantilevers: Extending The Toolbox For Reversible Colloidal Probes And Afm-Based Nanofluidics

Self-aligned Split Gate Electrodes Fabricated on Suspended Carbon Nanotubes

Local Oxidation of Titanium Thin Films Using an Atomic Force Microscope under Static and Pulsed Voltages

Use of PtC Nanotips for Low-Voltage Quantum Tunneling Applications

Single Layer Control of Nanoscale Metal-Insulator Transition at the LaAlO3/SrTiO3 Interface

Fabrication of Nanostructures on the Surface of Titanium Film Using SPM Nanolithograpy Technique

Local Anodic Oxidation of Superconducting NbN Thin Films by an Atomic Force Microscope

Fabrication of Carbon Nanotube Diode with Atomic Force Microscopy Manipulation

Sub-Nanometer Interfacial Oxides on Highly Oriented Pyrolytic Graphite and Carbon Nanotubes Enabled by Lateral Oxide Growth

Integration of a gate electrode into carbon nanotube devices for scanning tunneling microscopy

Nanopatterning of multicomponent van der Waals heterostructures using atomic force microscopy

Electron transport in bilayer graphene nano constrictions patterned using AFM nanolithography

Single electron tunneling through high-Q single-wall carbon nanotube NEMS resonators