Abstract:SmallVolume 6, Issue 10 p. 1077-1081 Communication Matrix-Assisted Dip-Pen Nanolithography and Polymer Pen Lithography† Ling Huang, Ling Huang School of Chemical and Biomedical Engineering Nanyang Technological University 70 Nanyang Drive, Singapore 637457 (Singapore)Search for more papers by this authorAdam B. Braunschweig, Adam B. Braunschweig Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorWooyoung Shim, Wooyoung Shim Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorLidong Qin, Lidong Qin Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorJong Kuk Lim, Jong Kuk Lim Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorSarah J. Hurst, Sarah J. Hurst Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorFengwei Huo, Fengwei Huo Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorCan Xue, Can Xue Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorJae-Won Jang, Jae-Won Jang Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorChad A. Mirkin, Corresponding Author Chad A. Mirkin [email protected] Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this author Ling Huang, Ling Huang School of Chemical and Biomedical Engineering Nanyang Technological University 70 Nanyang Drive, Singapore 637457 (Singapore)Search for more papers by this authorAdam B. Braunschweig, Adam B. Braunschweig Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorWooyoung Shim, Wooyoung Shim Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorLidong Qin, Lidong Qin Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorJong Kuk Lim, Jong Kuk Lim Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorSarah J. Hurst, Sarah J. Hurst Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorFengwei Huo, Fengwei Huo Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorCan Xue, Can Xue Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorJae-Won Jang, Jae-Won Jang Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this authorChad A. Mirkin, Corresponding Author Chad A. Mirkin [email protected] Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Department of Chemistry Department of Materials Science and Engineering International Institute for Nanotechnology, Northwestern University 2145 Sheridan Road, Evanston, IL 60208-3113 (USA)Search for more papers by this author First published: 19 May 2010 https://doi.org/10.1002/smll.200901198Citations: 75 † L. H., A. B. B., and W. S. contributed equally to this work. C.A.M. acknowledges AFOSR and DARPA-SPAWAR for support of this work. A.B.B. is grateful for an NIH Postdoctoral Fellowship (5F32CA13648-02). Read the full textAboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Graphical Abstract The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in size, shape, and solubility of these materials. Matrix-assisted dip-pen nanolithography and polymer-pen lithography provide a solution to this problem by utilizing a polymeric matrix that encapsulates the nanomaterials and delivers them to surfaces with precise control of feature size (see image). References 1 Y. N. Xia, J. A. Rogers, K. E. Paul, G. M. Whitesides, Chem. Rev. 1999, 99, 1823. 2 B. D. Gates, Q. B. Xu, M. Stewart, D. Ryan, C. G. Willson, G. M. Whitesides, Chem. Rev. 2005, 105, 1171. 3 U. C. Coskun, H. Mebrahtu, P. B. Huang, J. Huang, D. Sebba, A. Biasco, A. Makarovski, A. Lazarides, T. H. Labean, G. Finkelstein, Appl. Phys. Lett. 2008, 93, 123101. 4 P. Mendes, S. Jacke, K. Critchley, J. Plaza, Y. Chen, K. Nikitin, R. E. Palmer, J. A. Preece, S. D. Evans, D. Fitzmaurice, Langmuir 2004, 20, 3766. 5 S. Ko, I. Park, H. Pan, C. P. Grigoropoulos, A. P. Pisano, C. K. Luscombe, J. M. J. Frechet, Nano Lett. 2007, 7, 1869. 6 J. Garno, Y. Yang, N. A. Amro, S. Cruchon-Dupeyrat, S. Chen, G. Liu, Nano Lett. 2003, 3, 389. 7 E. Silva-Pinto, A. P. Gomes, C. B. Pinheiro, L. O. Ladeira, M. A. Pimenta, B. R. A. Neves, E. Silva-Pinto, Langmuir 2009, 25, 3356. 8 A. B. Braunschweig, F. W. Huo, C. A. Mirkin, Nat. Chem. 2009, 1, 353. 9 R. D. Piner, J. Zhu, F. Xu, S. H. Hong, C. A. Mirkin, Science 1999, 283, 661. 10 K. Salaita, Y. H. Wang, C. A. Mirkin, Nat. Nanotechnol. 2007, 2, 145. 11 D. S. Ginger, H. Zhang, C. A. Mirkin, Angew. Chem. Int. Ed. 2004, 43, 30. 12 F. W. Huo, Z. J. Zheng, G. F. Zheng, L. R. Giam, H. Zhang, C. A. Mirkin, Science 2008, 321, 1658. 13 X. F. Wang, D. A. Bullen, J. Zou, C. Liu, C. A. Mirkin, J. Vac. Sci. Technol. B 2004, 22, 2563. 14 D. Bullen, S. W. Chung, X. F. Wang, J. Zou, C. A. Mirkin, C. Liu, Appl. Phys. Lett. 2004, 84, 789. 15 M. Ben Ali, T. Ondarcuhu, M. Brust, C. Joachim, Langmuir 2002, 18, 872. 16 W. C. M. Wang, R. M. Stoltenberg, S. H. Liu, Z. N. Bao, ACS Nano 2008, 2, 2135. 17 G. Gundiah, N. S. John, P. J. Thomas, G. U. Kulkarni, C. N. R. Rao, S. Heun, Appl. Phys. Lett. 2004, 84, 5341. 18 H. T. Wang, O. A. Nafday, J. R. Haaheim, E. Tevaarwerk, N. A. Amro, R. G. Sanedrin, C. Y. Chang, F. Ren, S. J. Pearton, Appl. Phys. Lett. 2008, 93, 143105. 19 L. Ding, Y. Li, H. B. Chu, X. M. Li, J. Liu, J. Phys. Chem. B 2005, 109, 22337. 20 R. A. Vega, D. Maspoch, K. Salaita, C. A. Mirkin, Angew. Chem. Int. Ed. 2005, 44, 6013. 21 Y. H. Wang, D. Maspoch, S. L. Zou, G. C. Schatz, R. E. Smalley, C. A. Mirkin, Proc. Natl. Acad. Sci. U. S. A. 2006, 103, 2026. 22 Y. H. Wang, W. Wei, D. Maspoch, J. S. Wu, V. P. Dravid, C. A. Mirkin, Nano Lett. 2008, 8, 3761. 23 S. Sekula, J. Fuchs, S. Weg-Remers, P. Nagel, S. Schuppler, J. Fragala, N. Theilacker, M. Franueb, C. Wingren, P. Ellmark, C. A. K. Borrebaeck, C. A. Mirkin, H. Fuchs, S. Lenhert, Small 2008, 4, 1785. 24 Z. Zheng, J. W. Jang, G. Zheng, C. A. Mirkin, Angew. Chem. Int. Ed. 2008, 47, 9951. 25 J. W. Jang, R. G. Sanedrin, A. J. Senesi, Z. Zheng, X. Chen, S. Hwang, C. A. Mirkin, Small, 2009, 5, 1850. 26 Y. N. Xia, G. M. Whitesides, Angew. Chem. Int. Ed. 1998, 37, 551. 27 A. Hamed, Y. Y. Sun, Y. K. Tao, R. L. Meng, P. H. Hor, Phys. Rev. B 1993, 47, 10873. 28 H. Park, J. Park, A. K. L. Lim, E. H. Anderson, A. P. Alivisatos, P. L. McEuen, Nature 2000, 407, 57. 29 G. Frens, Nature Phys. Sci. 1973, 241, 20. 30 S. I. Stoeva, F. W. Huo, J. S. Lee, C. A. Mirkin, J. Am. Chem. Soc. 2005, 127, 15362. Citing Literature Supporting Information Detailed facts of importance to specialist readers are published as "Supporting Information". Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Filename Description smll_200901198_sm_supplfigs.pdf507.8 KB supplfigs Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article. Volume6, Issue10May 21 2010Pages 1077-1081 ReferencesRelatedInformation

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