Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenylsiloxane monolayers.

Generation of Nanostructures by Scanning Near-Field Photolithography of Self-Assembled Monolayers and Wet Chemical Etching

Photolithography Using Lateral Surface of Nanofibers

Light and Matter Co-Confined Multi-Photon Lithography

Fabrication of Sub-Diffraction-limit Molecular Structures by Scanning Near-Field Photolithography

Photopatterning of self-assembled monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

Matching the Resolution of Electron Beam Lithography by Scanning Near-Field Photolithography

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Nano-Patterning by Pulsed Laser Irradiation in Near Field

Direct Nanopatterning of Complex 3D Surfaces and Self-Aligned Superlattices via Molecular-Beam Holographic Lithography

Advances in direct optical lithography of nanomaterials

Surface Nano-fabrication by Laser Precision Engineering

Creation of a Micro-Nanoworld with Photons

Creation of Nanostructures by Interference Lithography for Modulation of Cell Behavior

Large Area Uniform Nanostructures Fabricated by Direct Femtosecond Laser Ablation

Unconventional Lithography for Patterned Nanomaterials

Fabrication of nanostructure on Au nano-film by nanosecond laser coupled with cantilevered scanning near-field optical microscopy probe

Beam Pen Lithography.

2D Surface Optical Lattice Formed by Plasmon Polaritons with Application to Nanometer-Scale Molecular Deposition