Abstract:Abstract Advances in femtosecond laser-material interaction facilitate the extension of maskless optical processing to the high efficiency and deep-subwavelength scale. Here, a hybrid plasmon lithography technique has been demonstrated by irradiating near-infrared femtosecond laser pulses onto the Si material coated with thin Cr films in a vacuum chamber, and superior nanograting structures are found to deeply penetrate through the thin Cr film into the underlying Si substrate. In stark contrast to the common ripple structures formed on the Si surface, the Cr-layer mediated Si nanograting structures not only exhibit the spatially super-regular arrangements with a deep-subwavelength period of 355 nm but also present the nonsinusoidal sharp-edged groove geometry with a large depth-to-width aspect ratio of 2.1. Theoretical analyses and calculations reveal that the anomalous structure characterizations are physically ascribed to the excitation of dual-interface coupled plasmons in the thin metal layer, which possess the squeezed spatial wavelength and the periodic columnar intensity distributions. Moreover, the further deepening of periodic nanostructures into the Si substrate is also elucidated by the simulation of electric field enhancements at the bottom of shallow grooves under irradiation of subsequent laser pulses. In combination with a wet etching process, the Si nanograting structures can be modified into the smooth and narrow-mouthed V -profiles, whose optical measurements show a near omnidirectional antireflection especially in the visible range of 565–750 nm, which is expected for the design of advanced photonic devices.

Fabrication of nanostructure on Au nano-film by nanosecond laser coupled with cantilevered scanning near-field optical microscopy probe

Nanofabrication mechanism of λ/20 features achieved by coupling field tip enhancement induced with nanosecond laser irradiating AFM probe tip

Controllable fabrication of Sub-20nm structures with coupling field tip enhancement effect induced by nanosecond pulsed laser irradiation

Laser Nano-Engineering with the Assistance of Scanning Probe Microscope and Optical Resonance in Microparticles

Fabrication of Nanostructures by Laser Optical Focusing

Surface Nano-fabrication by Laser Precision Engineering

Focused Ion Beam Assisted Interface Detection for Fabricating Functional Plasmonic Nanostructures

Femtosecond Laser Nano-Fabrication With Extended Processing Range

Study for Laser Controlled Fabrication of Micro/Nano-Structures of Silicon Based on Multi-Physics Model

Nanofabrication with the thermal AFM metallic tip irradiated by continuous laser

Fabrication And Characterization Of Near-Field Optical Fiber Nanoprobes With High Resolution And High Transmission Efficiency

Near-field optical characteristics of Ag nanoparticle within the near-field scope of a metallic AFM tip irradiated by SNOM laser

Nanofabrication of the gold scanning probe for the STM-SECM coupling system with nanoscale spatial resolution

Novel technology for controlled fabrication of aperture cantilever sensors for scanning near-field optical microscopy

Femtosecond Laser Precision Engineering: From Micron, Submicron, to Nanoscale

SPM-based Nanofabrication Using a Synchronization Technique

Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

Realization of Femtosecond-Resolved Near-Field Optical System and Its Application

Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

Fabrication of Nano-Electromechanical Structures Down to 20 nm by Spacer Technology

Development of optical fiber probe for the scanning near-field optical microscope