Abstract:Self-assembled monolayers (SAMs) of alkanethiols have been patterned on micrometre and nanometre length scales by exposure to light from a frequency doubled argon ion laser. Friction force microscopy shows that the patterning speed depends on the nature of the terminal group and is in the order COOH > CH3, the reverse of the order reported previously using a mercury arc lamp, indicating that a different photo-oxidation mechanism is responsible. It is suggested that this involves the creation of hot electrons at the gold surface that initiate oxidation of the adsorbate. Nanostructures have been fabricated using scanning near-field photolithography (SNP), in which the UV laser is coupled to a near-field scanning optical microscope. During SNP, the rates of writing required for complete oxidation correlate closely with oxidation rates measured during micropatterning, suggesting that the mechanism is essentially the same. SAMs on silver have been patterned, yielding linewidths smaller than 50 nm. The selective alkylation of hydrogen passivated Si has been demonstrated, yielding structures that may be used as resists for etching and demonstrating a powerful new capability-fluid-phase nanophotolithography. Patterned SAMs prepared using SNP have been used to selectively attach polymer nanoparticles, demonstrating their utility for the creation of functional molecular nanostructures. Nanopatterns generated by SNP have also been used as resists, enabling the etching of nanostructures into gold and the fabrication of three-dimensional nanostructures in silicon using a two-stage wet etch process.

Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenylsiloxane monolayers.

Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

Fabrication of Sub-Diffraction-limit Molecular Structures by Scanning Near-Field Photolithography

Dna Nanofabrication By Scanning Near-Field Photolithography Of Oligo (Ethylene Glycol) Terminated Sams: Controlled Scan-Rate Dependent Switching Between Head Group Oxidation And Tail Group Degradation

Generation of Nanostructures by Scanning Near-Field Photolithography of Self-Assembled Monolayers and Wet Chemical Etching

Patterning Silicon Surfaces with Covalently Attached Dna at Sub-Micrometer Resolution

Photopatterning of self-assembled monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

Nanoscale patterning of self-assembled monolayer (SAM)-functionalised substrates with single molecule contact printing

Scalable Lithography From Natural Dna Patterns Via Polyacrylamide Gel

Photopatterning of DNA Oligonucleotides on Silicon Surfaces with Micron-Scale Dimensions

Photochemical Fabrication of Three-Dimensional Micro- and Nano-Structured Surfaces from a C60 Monoadduct

Large-area molecular patterning with polymer pen lithography

Nano-Structures Fabrication by Laser Combined with Near-Field Scanning Optical Microscopy

Submicron Patterning of DNA Oligonucleotides on Silicon.

Molecular Lithography Through DNA-Mediated Etching and Masking of SiO2

DNA Nanostructures-Mediated Molecular Imprinting Lithography.

Fabrication of sub-50 nm solid-state nanostructures based on nanolithography

Fabrication Of Biomolecular Nanopatterns

Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

Matching the Resolution of Electron Beam Lithography by Scanning Near-Field Photolithography

Direct Writing Nanostructures on Au Nano-Film by Laser Irradiating Cantilevered Scanning Near-Field Optical Microscope Tip