Patterning Of Self-Assembled Monolayers By Phase-Shifting Mask And Its Applications In Large-Scale Assembly Of Nanowires

fan gao,dakuan zhang,jianyu wang,yun sheng,shancheng yan,xinran wang,kunji chen,jiancang shen,lijia pan,minmin zhou,yi shi
DOI: https://doi.org/10.1063/1.4907042
IF: 4
2015-01-01
Applied Physics Letters
Abstract:A nonselective micropatterning method of self-assembled monolayers (SAMs) based on laser and phase-shifting mask (PSM) is demonstrated. Laser beam is spatially modulated by a PSM, and periodic SAM patterns are generated sequentially through thermal desorption. Patterned wettability is achieved with alternating hydrophilic/hydrophobic stripes on octadecyltrichlorosilane monolayers. The substrate is then used to assemble CdS semiconductor nanowires (NWs) from a solution, obtaining well-aligned NWs in one step. Our results show valuably the application potential of this technique in engineering SAMs for integration of functional devices. (C) 2015 AIP Publishing LLC.
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