Abstract:Colloidal quantum dots (QDs) with a wide color gamut and high luminescent efficiency are promising for next-generation electronic and photonic devices. However, precise and scalable patterning of QDs without degrading their properties and their integration into commercially relevant devices, such as digitally addressable QD light-emitting diode (QLED) displays, remain challenging. Here, we develop electronically optimized diazirine-based cross-linkers for nondestructive, direct photopatterning of QDs and, ultimately, building the active-matrix QLED displays. The key to the cross-linker design is the introduction of electron-donating substituents that permit the formation of ground-state singlet carbenes for air-stable and benign QD photopatterning. Under ambient conditions, these cross-linkers enable the patterning of heavy metal-free QDs at a resolution of over 13,000 pixels per inch using commercial i-line photolithography. The patterned QD layers fully preserved their optical and optoelectronic properties. Pixelated electroluminescent devices with patterned InP/ZnSe/ZnS QD layers show a peak external quantum efficiency of 15.3% and a maximum luminance of about 40,000 cd m-2, outperforming those made by existing QD patterning approaches. We further show the seamless integration of patterned QLEDs with thin-film transistor circuits and the fabrication of dual-color active-matrix displays. These results underscore the importance of designing photochemistry for QD patterning, and promise the implementation of direct photopatterning methods in manufacturing commercial QLED displays and other integrated QD device platforms.

Site-selective assembly of quantum dots on patterned self-assembled monolayers fabricated by laser direct-writing.

Programmable assembly of CdTe quantum dots into microstructures by femtosecond laser direct writing

Photopatterning of self-assembled monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

Fabrication of Ultrathin Films of CdTe Quantum Dots by Electrostatic Self-assembly Method

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Patterning Of Self-Assembled Monolayers By Phase-Shifting Mask And Its Applications In Large-Scale Assembly Of Nanowires

Simple And Fast Patterning Process By Laser Direct Writing For Perovskite Quantum Dots

Photosensitizer-assisted Direct 2D Patterning and 3D Printing of Colloidal Quantum Dots

The micropatterning of layers of colloidal quantum dots with inorganic ligands using selective wet etching

HIGHLY ORDERED MICRO-ARRAYS OF CdSe QUANTUM DOTS ON CHEMICALLY PATTERNED SUBSTRATES

Optical Patterning: Direct Optical Patterning of Quantum Dot Light‐Emitting Diodes via In Situ Ligand Exchange (Adv. Mater. 46/2020)

Plasmon-Enhanced Surface-State Emission of CdSe Quantum Dots and Its Application to Microscale Luminescence Patterns

Molecular Patterning and Directed Self-Assembly of Gold Nanoparticles on GaAs

Spatially Selective Optical Tuning of Quantum Dot Thin Film Luminescence.

Lasing by Template‐Assisted Self‐Assembled Quantum Dots

Patterning Organic Fluorescent Molecules with SAM Patterns

Layer-by-Layer Surface Modification and Patterned Electrostatic Deposition of Quantum Dots

Area-selective Deposition of Self-Assembled Monolayers on SiO2∕Si(100) Patterns

Fabrication and Responsive Behaviour of Quantum Dot/PNIPAM Micropatterns Obtained by Template Copolymerization in Water

High-resolution in situ patterning of perovskite quantum dots via femtosecond laser direct writing

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers