Abstract:QD‐Polymer composites for direct photolithography are of great significance to the development of today's display technology. This review presents representative design strategies for QD‐Polymer that can be used for direct photolithography and the development of the direct photolithography process for de‐photomasking, which provides guidance for advancing QD‐Polymer for high‐quality patterning and display applications. For the new display technology based on quantum dots (QDs), achieving high‐precision red, green, and blue pixel arrays has always been a research focus in the pursuit of high‐quality and vivid image displays. However, problems such as material stability and process environment make it difficult to guarantee the quality of high‐precision patterns. The new optical patterning technology represented by direct photolithography is considered a highly promising method for achieving ultrafine patterns at the submicron level. This process prepares patterned quantum dot‐polymer films through light‐induced chemical changes. This paper reviews the progress of direct photolithography research focused on QD‐polymer materials and presents recent advances in such processes for monochromatic/multicolor light patterning. The article classifies QD‐polymers into three categories by combining QDs with polymers in different ways, including polymer‐coated QDs, polymers as QD ligands, and polymers as photocrosslinkers for QDs. Their synthesis schemes, functional features, and challenges are also presented. In addition, a scheme to remove the photomask during direct lithography using lasers and light field modulation is also proposed. It aims to provide readers and researchers with some generalized research information and improvement ideas. This can further advance the development of direct photolithography for QD‐polymers.

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Optical Patterning: Direct Optical Patterning of Quantum Dot Light‐Emitting Diodes via In Situ Ligand Exchange (Adv. Mater. 46/2020)

Recent progress in non-photolithographic patterning of polymer thin films

Nondestructive Direct Patterning of Both Hole Transport and Emissive Layers for Pixelated Quantum-Dot Light-Emitting Diodes

Direct Photolithography Patterning of Quantum Dot‐Polymer

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning

Quantum dot patterning by direct photolithography

Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Ligand‐Crosslinking Strategy for Efficient Quantum Dot Light‐Emitting Diodes via Thiol‐Ene Click Chemistry

High-resolution patterning of colloidal quantum dots via non-destructive, light-driven ligand crosslinking

The Role of Liquid Ink Transport in the Direct Placement of Quantum Dot Emitters Onto Sub-Micrometer Antennas by Dip-Pen Nanolithography.

Direct Optical Patterning of Nanocrystal-Based Thin-Film Transistors and Light-Emitting Diodes through Native Ligand Cleavage

Photosensitizer-assisted Direct 2D Patterning and 3D Printing of Colloidal Quantum Dots

Direct Synthesis of Perovskite Quantum Dot Photoresist for Direct Photolithography

Quantum Dots Photoresist for Direct Photolithography Patterning

Advances in direct optical lithography of nanomaterials

Solvent Resistant Hole-Transporting Thin Films Via Diacetylene Cross-Linking and Their Applications in Solution-Processed QLEDs

Quantum Dot Patterning and Encapsulation by Maskless Lithography for Display Technologies.

Colloidal Quantum Dot Inks for Single-Step-Fabricated Field-Effect Transistors: The Importance of Postdeposition Ligand Removal