Abstract:QD‐Polymer composites for direct photolithography are of great significance to the development of today's display technology. This review presents representative design strategies for QD‐Polymer that can be used for direct photolithography and the development of the direct photolithography process for de‐photomasking, which provides guidance for advancing QD‐Polymer for high‐quality patterning and display applications. For the new display technology based on quantum dots (QDs), achieving high‐precision red, green, and blue pixel arrays has always been a research focus in the pursuit of high‐quality and vivid image displays. However, problems such as material stability and process environment make it difficult to guarantee the quality of high‐precision patterns. The new optical patterning technology represented by direct photolithography is considered a highly promising method for achieving ultrafine patterns at the submicron level. This process prepares patterned quantum dot‐polymer films through light‐induced chemical changes. This paper reviews the progress of direct photolithography research focused on QD‐polymer materials and presents recent advances in such processes for monochromatic/multicolor light patterning. The article classifies QD‐polymers into three categories by combining QDs with polymers in different ways, including polymer‐coated QDs, polymers as QD ligands, and polymers as photocrosslinkers for QDs. Their synthesis schemes, functional features, and challenges are also presented. In addition, a scheme to remove the photomask during direct lithography using lasers and light field modulation is also proposed. It aims to provide readers and researchers with some generalized research information and improvement ideas. This can further advance the development of direct photolithography for QD‐polymers.

Nondestructive Direct Patterning of Both Hole Transport and Emissive Layers for Pixelated Quantum-Dot Light-Emitting Diodes

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

Quantum Dot Patterning and Encapsulation by Maskless Lithography for Display Technologies.

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Direct Photo-Patterning of Efficient and Stable Quantum Dot Light-Emitting Diodes via Light-Triggered, Carbocation-Enabled Ligand Stripping.

High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning

Optical Patterning: Direct Optical Patterning of Quantum Dot Light‐Emitting Diodes via In Situ Ligand Exchange (Adv. Mater. 46/2020)

Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Photosensitizer-assisted Direct 2D Patterning and 3D Printing of Colloidal Quantum Dots

Direct Photolithography Patterning of Quantum Dot‐Polymer

High-resolution patterning of colloidal quantum dots via non-destructive, light-driven ligand crosslinking

Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition

High-Resolution Patterning of Perovskite Quantum Dots via Femtosecond Laser-Induced Forward Transfer

Quantum Dots Photoresist for Direct Photolithography Patterning

Large-area patterning of full-color quantum dot arrays beyond 1000 pixels per inch by selective electrophoretic deposition

Design of the Hole-Injection/Hole-Transport Interfaces for Stable Quantum-Dot Light-Emitting Diodes

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Direct Optical Patterning of Nanocrystal-Based Thin-Film Transistors and Light-Emitting Diodes through Native Ligand Cleavage

Recent Developments in Quantum Dot Patterning Technology for Quantum Dot Display

Nondestructive Direct Optical Patterning of Perovskite Nanocrystals with Carbene-Based Ligand Cross-Linkers.

Direct optical patterning of perovskite nanocrystals with ligand cross-linkers