Abstract:Colloidal quantum dots (QDs) with a wide color gamut and high luminescent efficiency are promising for next-generation electronic and photonic devices. However, precise and scalable patterning of QDs without degrading their properties and their integration into commercially relevant devices, such as digitally addressable QD light-emitting diode (QLED) displays, remain challenging. Here, we develop electronically optimized diazirine-based cross-linkers for nondestructive, direct photopatterning of QDs and, ultimately, building the active-matrix QLED displays. The key to the cross-linker design is the introduction of electron-donating substituents that permit the formation of ground-state singlet carbenes for air-stable and benign QD photopatterning. Under ambient conditions, these cross-linkers enable the patterning of heavy metal-free QDs at a resolution of over 13,000 pixels per inch using commercial i-line photolithography. The patterned QD layers fully preserved their optical and optoelectronic properties. Pixelated electroluminescent devices with patterned InP/ZnSe/ZnS QD layers show a peak external quantum efficiency of 15.3% and a maximum luminance of about 40,000 cd m-2, outperforming those made by existing QD patterning approaches. We further show the seamless integration of patterned QLEDs with thin-film transistor circuits and the fabrication of dual-color active-matrix displays. These results underscore the importance of designing photochemistry for QD patterning, and promise the implementation of direct photopatterning methods in manufacturing commercial QLED displays and other integrated QD device platforms.

Large-area patterning of full-color quantum dot arrays beyond 1000 pixels per inch by selective electrophoretic deposition

Full-Colour Quantum Dot Displays Fabricated by Transfer Printing

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition

High‐Resolution Full‐Color Quantum Dots Patterning for Display Applications Based on Femtosecond Laser‐induced Forward Transfer

Wafer-scale patterning of high-resolution quantum dot films with a thickness over 10 μm for improved color conversion.

High-efficiency and high-resolution patterned quantum dot light emitting diodes by electrohydrodynamic printing

High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning

Recent Developments in Quantum Dot Patterning Technology for Quantum Dot Display

Dewetting-assisted inkjet printing and optimized solvent mixture of Cd-free InP quantum dots for high-resolution pixel-pattern

High-resolution patterning of colloidal quantum dots via non-destructive, light-driven ligand crosslinking

Quantum Dot Patterning and Encapsulation by Maskless Lithography for Display Technologies.

Perovskite quantum dot microarrays: In situ fabrication via direct print photopolymerization

High-Resolution Colloidal Quantum Dot Film Photolithography via Atomic Layer Deposition of ZnO

Device Physics and Device Chemistry of Quantum-Dot Light-Emitting Diodes

Quantum‐Dot Light‐Emitting Diodes for Large‐Area Displays: Towards the Dawn of Commercialization

Beyond OLED: Efficient Quantum Dot Light‐Emitting Diodes for Display and Lighting Application

Direct Photo-Patterning of Efficient and Stable Quantum Dot Light-Emitting Diodes via Light-Triggered, Carbocation-Enabled Ligand Stripping.

14.4: Inkjet Printing Patterned Quantum Dot Microarrays

Advances in Quantum-Dot-Based Displays

Luminescence Enhancement, Encapsulation, and Patterning of Quantum Dots Toward Display Applications