Abstract:Colloidal quantum dots (QDs) with a wide color gamut and high luminescent efficiency are promising for next-generation electronic and photonic devices. However, precise and scalable patterning of QDs without degrading their properties and their integration into commercially relevant devices, such as digitally addressable QD light-emitting diode (QLED) displays, remain challenging. Here, we develop electronically optimized diazirine-based cross-linkers for nondestructive, direct photopatterning of QDs and, ultimately, building the active-matrix QLED displays. The key to the cross-linker design is the introduction of electron-donating substituents that permit the formation of ground-state singlet carbenes for air-stable and benign QD photopatterning. Under ambient conditions, these cross-linkers enable the patterning of heavy metal-free QDs at a resolution of over 13,000 pixels per inch using commercial i-line photolithography. The patterned QD layers fully preserved their optical and optoelectronic properties. Pixelated electroluminescent devices with patterned InP/ZnSe/ZnS QD layers show a peak external quantum efficiency of 15.3% and a maximum luminance of about 40,000 cd m-2, outperforming those made by existing QD patterning approaches. We further show the seamless integration of patterned QLEDs with thin-film transistor circuits and the fabrication of dual-color active-matrix displays. These results underscore the importance of designing photochemistry for QD patterning, and promise the implementation of direct photopatterning methods in manufacturing commercial QLED displays and other integrated QD device platforms.

High-resolution patterning of colloidal quantum dots via non-destructive, light-driven ligand crosslinking

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

Full-Colour Quantum Dot Displays Fabricated by Transfer Printing

Physical approaches to tuning the luminescence color patterns of colloidal quantum dots

Ligand‐Crosslinking Strategy for Efficient Quantum Dot Light‐Emitting Diodes via Thiol‐Ene Click Chemistry

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Large-area patterning of full-color quantum dot arrays beyond 1000 pixels per inch by selective electrophoretic deposition

Photosensitizer-assisted Direct 2D Patterning and 3D Printing of Colloidal Quantum Dots

High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning

The micropatterning of layers of colloidal quantum dots with inorganic ligands using selective wet etching

CdSe/ZnS Quantum Dot Patterned Arrays for Full-Color Light-Emitting Diodes in Active-Matrix QLED Display

High-Resolution Multicolor Patterning of InP Quantum Dot Films by Atomic Layer Deposition of ZnO

High-Resolution Colloidal Quantum Dot Film Photolithography via Atomic Layer Deposition of ZnO

Direct Photo-Patterning of Efficient and Stable Quantum Dot Light-Emitting Diodes via Light-Triggered, Carbocation-Enabled Ligand Stripping.

Nondestructive Direct Patterning of Both Hole Transport and Emissive Layers for Pixelated Quantum-Dot Light-Emitting Diodes

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Wafer-scale patterning of high-resolution quantum dot films with a thickness over 10 μm for improved color conversion.

Optical Patterning: Direct Optical Patterning of Quantum Dot Light‐Emitting Diodes via In Situ Ligand Exchange (Adv. Mater. 46/2020)

Direct Micro/Nano Patterning of Multiple Colored Quantum Dots by Large Area and Multilayer Imprinting

Beyond a Linker: the Role of Photochemistry of Crosslinkers in the Direct Optical Patterning of Colloidal Nanocrystals.

Tailoring the Interfacial Structure of Colloidal "giant" Quantum Dots for Optoelectronic Applications.