Abstract:QD‐Polymer composites for direct photolithography are of great significance to the development of today's display technology. This review presents representative design strategies for QD‐Polymer that can be used for direct photolithography and the development of the direct photolithography process for de‐photomasking, which provides guidance for advancing QD‐Polymer for high‐quality patterning and display applications. For the new display technology based on quantum dots (QDs), achieving high‐precision red, green, and blue pixel arrays has always been a research focus in the pursuit of high‐quality and vivid image displays. However, problems such as material stability and process environment make it difficult to guarantee the quality of high‐precision patterns. The new optical patterning technology represented by direct photolithography is considered a highly promising method for achieving ultrafine patterns at the submicron level. This process prepares patterned quantum dot‐polymer films through light‐induced chemical changes. This paper reviews the progress of direct photolithography research focused on QD‐polymer materials and presents recent advances in such processes for monochromatic/multicolor light patterning. The article classifies QD‐polymers into three categories by combining QDs with polymers in different ways, including polymer‐coated QDs, polymers as QD ligands, and polymers as photocrosslinkers for QDs. Their synthesis schemes, functional features, and challenges are also presented. In addition, a scheme to remove the photomask during direct lithography using lasers and light field modulation is also proposed. It aims to provide readers and researchers with some generalized research information and improvement ideas. This can further advance the development of direct photolithography for QD‐polymers.

Optical Patterning: Direct Optical Patterning of Quantum Dot Light‐Emitting Diodes via In Situ Ligand Exchange (Adv. Mater. 46/2020)

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Photolithographic Patterning of Organic Color-Centers.

Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Nondestructive Direct Patterning of Both Hole Transport and Emissive Layers for Pixelated Quantum-Dot Light-Emitting Diodes

Photosensitizer-assisted Direct 2D Patterning and 3D Printing of Colloidal Quantum Dots

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Quantum Dots Photoresist for Direct Photolithography Patterning

Simple And Fast Patterning Process By Laser Direct Writing For Perovskite Quantum Dots

High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning

Ligand‐Crosslinking Strategy for Efficient Quantum Dot Light‐Emitting Diodes via Thiol‐Ene Click Chemistry

Direct Photolithography Patterning of Quantum Dot‐Polymer

Quantum Dots Synthesis Through Direct Laser Patterning: A Review

Direct Photo-Patterning of Efficient and Stable Quantum Dot Light-Emitting Diodes via Light-Triggered, Carbocation-Enabled Ligand Stripping.

Quantum Dot Patterning and Encapsulation by Maskless Lithography for Display Technologies.

Direct optical patterning of nanocrystal-based thin-film transistors and light-emitting diodes through native ligand cleavage

Direct Patterning of Colloidal Nanocrystals Via Thermally Activated Ligand Chemistry.

High-resolution patterning of colloidal quantum dots via non-destructive, light-driven ligand crosslinking

Direct Micro/Nano Patterning of Multiple Colored Quantum Dots by Large Area and Multilayer Imprinting