Abstract:QD‐Polymer composites for direct photolithography are of great significance to the development of today's display technology. This review presents representative design strategies for QD‐Polymer that can be used for direct photolithography and the development of the direct photolithography process for de‐photomasking, which provides guidance for advancing QD‐Polymer for high‐quality patterning and display applications. For the new display technology based on quantum dots (QDs), achieving high‐precision red, green, and blue pixel arrays has always been a research focus in the pursuit of high‐quality and vivid image displays. However, problems such as material stability and process environment make it difficult to guarantee the quality of high‐precision patterns. The new optical patterning technology represented by direct photolithography is considered a highly promising method for achieving ultrafine patterns at the submicron level. This process prepares patterned quantum dot‐polymer films through light‐induced chemical changes. This paper reviews the progress of direct photolithography research focused on QD‐polymer materials and presents recent advances in such processes for monochromatic/multicolor light patterning. The article classifies QD‐polymers into three categories by combining QDs with polymers in different ways, including polymer‐coated QDs, polymers as QD ligands, and polymers as photocrosslinkers for QDs. Their synthesis schemes, functional features, and challenges are also presented. In addition, a scheme to remove the photomask during direct lithography using lasers and light field modulation is also proposed. It aims to provide readers and researchers with some generalized research information and improvement ideas. This can further advance the development of direct photolithography for QD‐polymers.

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