Abstract:Colloidal quantum dots (QDs) with a wide color gamut and high luminescent efficiency are promising for next-generation electronic and photonic devices. However, precise and scalable patterning of QDs without degrading their properties and their integration into commercially relevant devices, such as digitally addressable QD light-emitting diode (QLED) displays, remain challenging. Here, we develop electronically optimized diazirine-based cross-linkers for nondestructive, direct photopatterning of QDs and, ultimately, building the active-matrix QLED displays. The key to the cross-linker design is the introduction of electron-donating substituents that permit the formation of ground-state singlet carbenes for air-stable and benign QD photopatterning. Under ambient conditions, these cross-linkers enable the patterning of heavy metal-free QDs at a resolution of over 13,000 pixels per inch using commercial i-line photolithography. The patterned QD layers fully preserved their optical and optoelectronic properties. Pixelated electroluminescent devices with patterned InP/ZnSe/ZnS QD layers show a peak external quantum efficiency of 15.3% and a maximum luminance of about 40,000 cd m-2, outperforming those made by existing QD patterning approaches. We further show the seamless integration of patterned QLEDs with thin-film transistor circuits and the fabrication of dual-color active-matrix displays. These results underscore the importance of designing photochemistry for QD patterning, and promise the implementation of direct photopatterning methods in manufacturing commercial QLED displays and other integrated QD device platforms.

Direct in situ photolithography of perovskite quantum dots based on photocatalysis of lead bromide complexes

Direct Synthesis of Perovskite Quantum Dot Photoresist for Direct Photolithography

Novel Direct Nanopatterning Approach to Fabricate Periodically Nanostructured Perovskite for Optoelectronic Applications

Polymerizable Monomer Solvents Enabled Direct in Situ Photolithography of Perovskite Quantum Dots

A Photoinitiator-Grafted Photoresist for Direct in Situ Lithography of Perovskite Quantum Dots

In Situ Inkjet Printing Strategy for Fabricating Perovskite Quantum Dot Patterns

Perovskite quantum dot microarrays: In situ fabrication via direct print photopolymerization

In Situ Patterning Perovskite Quantum Dots by Direct Laser Writing Fabrication

High-resolution in situ patterning of perovskite quantum dots via femtosecond laser direct writing

Direct in situ photolithography of ultra-stable CsPbBr3 quantum dot arrays based on crosslinking polymerization

Perovskite Quantum Dot Microarrays:In Situ Fabrication Via Direct Print Photopolymerization

In Situ Formation of Iodide Precursor for Perovskite Quantum Dots with Application in Efficient Solar Cells

Direct Lithography of Perovskite Quantum Dots Inside an Organic Transparent Medium

Robust Integration of Polymerizable Perovskite Quantum Dots with Responsive Polymers Enables 4D-Printed Self-Deployable Information Display

High-Resolution Patterning of Perovskite Quantum Dots via Femtosecond Laser-Induced Forward Transfer

Direct optical patterning of perovskite nanocrystals with ligand cross-linkers

In-situ inkjet printing of perovskite single-crystal array embedded PDMS film for wearable light-emitting devices.

In Situ Fabricated Perovskite Quantum Dots: From Materials to Applications

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

Nondestructive Direct Optical Patterning of Perovskite Nanocrystals with Carbene-Based Ligand Cross-Linkers.

Electrophoretic‐Driven in Situ Polymerization Depositing High‐Quality Perovskite Films for Photodetectors