Abstract:For practical applications of 2D perovskites, a femtosecond laser direct writing method for patterning of 2D perovskites is proposed. Benefiting from the flexible, fine, and non‐thermal diffused patterning capabilities of a femtosecond laser, diverse 2D perovskite patterns exhibit bright and uniform emission properties without any pinholes and cracks and a high resolution of approximate 2 μm line width. 2D perovskites have been considered as promising candidates for optoelectronic devices due to their good optical and electronic properties compared to 3D perovskites with significantly higher stability. Considering the commercial applications involving displays, image sensors, and fluorescent anti‐counterfeiting labels, the patterning technique of 2D perovskites is urgently required. However, existing patterning approaches still have challenges in high‐resolution fabrication. Here, a facile femtosecond laser direct writing method to fabricate arbitrarily patterned 2D perovskite films with well‐defined profiles and uniform fluorescence properties is developed. The flexible, fine, and non‐thermal diffused patterning abilities of femtosecond laser facilitate diverse 2D perovskite patterns exhibiting bright emission without any pinholes and cracks, as well as high resolution of approximate 2 μm line width. Based on this efficient patterning technique, this study demonstrates fluorescent anti‐counterfeiting labels (quick response code embedded with microlines) based on 2D perovskite films with high humidity stability, which can be identified from 43% to 96% relative humidity. This high‐resolution, reliable, efficient, and facile patterning technique for 2D perovskites with high humidity stability provides a promising technical route for 2D perovskite‐based optoelectronic applications.

High-resolution in situ patterning of perovskite quantum dots via femtosecond laser direct writing

High-Resolution Patterning of Perovskite Quantum Dots via Femtosecond Laser-Induced Forward Transfer

In Situ Patterning Perovskite Quantum Dots by Direct Laser Writing Fabrication

Simple And Fast Patterning Process By Laser Direct Writing For Perovskite Quantum Dots

Direct in situ photolithography of perovskite quantum dots based on photocatalysis of lead bromide complexes

Micropore filling fabrication of high resolution patterned PQDs with a pixel size less than 5 μm

In Situ Inkjet Printing Strategy for Fabricating Perovskite Quantum Dot Patterns

P‐4.8: In‐situ Patterning Perovskite Quantum Dots by Direct Laser Writing Fabrication

High‐Resolution Patterning of 2D Perovskite Films through Femtosecond Laser Direct Writing

High-Resolution In Situ Crystallization and Patterning of a CsPbBr 3 Film via Femtosecond Laser Printing

High-Resolution in Situ Crystallization and Patterning of a CsPbBr3 Film Via Femtosecond Laser Printing

Direct Lithography of Perovskite Quantum Dots Inside an Organic Transparent Medium

Femtosecond Laser Regulatory Focus Ablation Patterning of a Fluorescent Film Up to 1/10 of the Scale of the Diffraction Limit.

In Situ Formation of Iodide Precursor for Perovskite Quantum Dots with Application in Efficient Solar Cells

Femtosecond Laser Direct Writing of Perovskite Patterns with Whispering Gallery Mode Lasing

Photosensitizer-assisted Direct 2D Patterning and 3D Printing of Colloidal Quantum Dots

Femtosecond Laser Direct Ablating Micro/Nanostructures and Micropatterns on Ch3nh3pbi3 Single Crystal

A Photoinitiator-Grafted Photoresist for Direct in Situ Lithography of Perovskite Quantum Dots

Perovskite Quantum Dot Microarrays:In Situ Fabrication Via Direct Print Photopolymerization

Direct optical patterning of perovskite nanocrystals with ligand cross-linkers

Direct Synthesis of Perovskite Quantum Dot Photoresist for Direct Photolithography