Abstract:Colloidal quantum dots (QDs) with a wide color gamut and high luminescent efficiency are promising for next-generation electronic and photonic devices. However, precise and scalable patterning of QDs without degrading their properties and their integration into commercially relevant devices, such as digitally addressable QD light-emitting diode (QLED) displays, remain challenging. Here, we develop electronically optimized diazirine-based cross-linkers for nondestructive, direct photopatterning of QDs and, ultimately, building the active-matrix QLED displays. The key to the cross-linker design is the introduction of electron-donating substituents that permit the formation of ground-state singlet carbenes for air-stable and benign QD photopatterning. Under ambient conditions, these cross-linkers enable the patterning of heavy metal-free QDs at a resolution of over 13,000 pixels per inch using commercial i-line photolithography. The patterned QD layers fully preserved their optical and optoelectronic properties. Pixelated electroluminescent devices with patterned InP/ZnSe/ZnS QD layers show a peak external quantum efficiency of 15.3% and a maximum luminance of about 40,000 cd m-2, outperforming those made by existing QD patterning approaches. We further show the seamless integration of patterned QLEDs with thin-film transistor circuits and the fabrication of dual-color active-matrix displays. These results underscore the importance of designing photochemistry for QD patterning, and promise the implementation of direct photopatterning methods in manufacturing commercial QLED displays and other integrated QD device platforms.

Micropore filling fabrication of high resolution patterned PQDs with a pixel size less than 5 μm

High-resolution in situ patterning of perovskite quantum dots via femtosecond laser direct writing

High-Resolution Patterning of Perovskite Quantum Dots via Femtosecond Laser-Induced Forward Transfer

Wafer-scale patterning of high-resolution quantum dot films with a thickness over 10 μm for improved color conversion.

Novel Direct Nanopatterning Approach to Fabricate Periodically Nanostructured Perovskite for Optoelectronic Applications

Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition

In Situ Formation of Iodide Precursor for Perovskite Quantum Dots with Application in Efficient Solar Cells

Direct in situ photolithography of perovskite quantum dots based on photocatalysis of lead bromide complexes

In Situ Patterning Perovskite Quantum Dots by Direct Laser Writing Fabrication

Perovskite quantum dot microarrays: In situ fabrication via direct print photopolymerization

Ultra‐High‐Resolution Perovskite Quantum Dot Light‐Emitting Diodes

High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning

Nondestructive Direct Patterning of Both Hole Transport and Emissive Layers for Pixelated Quantum-Dot Light-Emitting Diodes

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

Large-area patterning of full-color quantum dot arrays beyond 1000 pixels per inch by selective electrophoretic deposition

Highly luminescent perovskite quantum dots for light-emitting devices: photopatternable perovskite quantum dot–polymer nanocomposites

In Situ Inkjet Printing Strategy for Fabricating Perovskite Quantum Dot Patterns

The micropatterning of layers of colloidal quantum dots with inorganic ligands using selective wet etching

In Situ Fabricated Perovskite Quantum Dots: From Materials to Applications

Strongly-ligated Perovskite Quantum Dots with Precisely Controlled Dimensions and Architectures for White Light-Emitting Diodes

High-Resolution Multicolor Patterning of InP Quantum Dot Films by Atomic Layer Deposition of ZnO