Quantum dot patterning by direct photolithography

Junpeng Fan,Lei Qian

DOI: https://doi.org/10.1038/s41565-022-01187-0

IF: 38.3

2022-08-12

Nature Nanotechnology

Abstract:A 'dual-ligand passivation system' is designed and synthesized to functionalize colloidal quantum dots to realize ultra-high resolution patterns by direct photolithography.

materials science, multidisciplinary,nanoscience & nanotechnology

What problem does this paper attempt to address?

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Yuan Qie,Hailong Hu,Kuibao Yu,Chao Zhong,Songman Ju,Yanbing Liu,Tailiang Guo,Fushan Li

DOI: https://doi.org/10.1021/acs.nanolett.3c04230

IF: 10.8

2024-01-18

Nano Letters

Abstract:The photolithographic patterning of fine quantum dot (QD) films is of great significance for the construction of QD optoelectronic device arrays. However, the photolithography methods reported so far either introduce insulating photoresist or manipulate the surface ligands of QDs, each of which has negative effects on device performance. Here, we report a direct photolithography strategy without photoresist and without engineering the QD surface ligands. Through cross-linking of the surrounding...

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Taewoo Ko,Samir Kumar,Sanghoon Shin,Dongmin Seo,Sungkyu Seo

DOI: https://doi.org/10.3390/nano13142111

IF: 5.3

2023-07-20

Nanomaterials

Abstract:Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes. Several patterning methods have been developed, but all lack the precision and reproducibility required to fabricate precise, complex patterns of less than one micrometer in size, or require specialized crosslinking ligands, limiting their application. In this study, we present a novel approach to directly pattern QD nanopatterns by electron beam lithography using commercially available colloidal QDs without additional modifications. We have successfully generated reliable dot and line QD patterns with dimensions as small as 140 nm. In addition, we have shown that using a 10 nm SiO2 spacer layer on a 50 nm Au layer substrate can double the fluorescence intensity compared to QDs on the Au layer without SiO2. This method takes advantage of traditional nanolithography without the need for a resist layer.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
Optical Patterning: Direct Optical Patterning of Quantum Dot Light‐Emitting Diodes via In Situ Ligand Exchange (Adv. Mater. 46/2020)

Himchan Cho,Jia‐Ahn Pan,Haoqi Wu,Xinzheng Lan,Igor Coropceanu,Yuanyuan Wang,Wooje Cho,Ethan A. Hill,John S. Anderson,Dmitri V. Talapin

DOI: https://doi.org/10.1002/adma.202070346

IF: 29.4

2020-11-01

Advanced Materials

Abstract:<p>In article number <a href="https://doi.org/10.1002/adma.202003805">2003805</a>, Dmitri V. Talapin and co‐workers demonstrate photoresist‐free, high‐resolution optical patterning of quantum dot (QD) light‐emitting diodes by using photoacid generators that induce photochemical reactions and in situ ligand exchange in QD films. Uniform electroluminescence patterns of QDs are produced with feature size down to 1.5 μm while preserving the structural, optical, and electronic properties of the patterned QDs. This advanced patterning method can boost the realization of not only QD electroluminescence displays but also other integrated optoelectronic devices using colloidal QDs. </p>

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
Photolithographic Patterning of Organic Color-Centers.

Zhongjie Huang,Lyndsey R Powell,Xiaojian Wu,Mijin Kim,Haoran Qu,Peng Wang,Jacob L Fortner,Beibei Xu,Allen L Ng,YuHuang Wang

DOI: https://doi.org/10.1002/adma.201906517

IF: 29.4

2020-01-01

Advanced Materials

Abstract:Organic color-centers (OCCs) have emerged as promising single-photon emitters for solid-state quantum technologies, chemically specific sensing, and near-infrared bioimaging. However, these quantum light sources are currently synthesized in bulk solution, lacking the spatial control required for on-chip integration. The ability to pattern OCCs on solid substrates with high spatial precision and molecularly defined structure is essential to interface electronics and advance their quantum applications. Herein, a lithographic generation of OCCs on solid-state semiconducting single-walled carbon nanotube films at spatially defined locations is presented. By using light-driven diazoether chemistry, it is possible to directly pattern p-nitroaryl OCCs, which demonstrate chemically specific spectral signatures at programmed positions as confirmed by Raman mapping and hyperspectral photoluminescence imaging. This light-driven technique enables the fabrication of OCC arrays on solid films that fluoresce in the shortwave infrared and presents an important step toward the direct writing of quantum emitters and other functionalities at the molecular level.
Photosensitizer-assisted Direct 2D Patterning and 3D Printing of Colloidal Quantum Dots

Wenyue Qing,Yilong Si,Mingfeng Cai,Likuan Zhou,Longjia Wu,Zhengwei Hou,Dan Liu,Xiaoli Tian,Wangyu Liu,Linhan Lin,Hao Zhang

DOI: https://doi.org/10.1007/s12274-024-6947-0

IF: 9.9

2024-01-01

Nano Research

Abstract:Direct photopatterning is a powerful strategy for patterning colloidal quantum dots (QDs) for their integration in various electronic and optoelectronic devices. However, ultraviolet (UV) exposure required for QD patterning, especially those with short wavelength (e.g., deep UV light), can degrade the photo-, and electroluminescence, and other properties of patterned QDs. Here we develop a photosensitizer-assisted approach for direct photopatterning of QDs with h-line (centered at 405 nm) UV light and better preservation of their luminescent properties. This approach uses a photosensitizer that can absorb the h-line UV light and transfer the energy to activate bisazide-based crosslinkers via Dexter energy transfer. Uniform, high-resolution (smallest feature size, 2 µm), and full-color patterns of red, green, and blue QD layers can be achieved. The patterned QD layers maintain up to ∼ 90
High-resolution patterning of colloidal quantum dots via non-destructive, light-driven ligand crosslinking

Jeehye Yang,Donghyo Hahm,Kyunghwan Kim,Seunghyun Rhee,Myeongjae Lee,Seunghan Kim,Jun Hyuk Chang,Hye Won Park,Jaehoon Lim,Minkyoung Lee,Hyeokjun Kim,Joohee Bang,Hyungju Ahn,Jeong Ho Cho,Jeonghun Kwak,BongSoo Kim,Changhee Lee,Wan Ki Bae,Moon Sung Kang

DOI: https://doi.org/10.1038/s41467-020-16652-4

IF: 16.6

2020-06-08

Nature Communications

Abstract:Abstract Establishing multi-colour patterning technology for colloidal quantum dots is critical for realising high-resolution displays based on the material. Here, we report a solution-based processing method to form patterns of quantum dots using a light-driven ligand crosslinker, ethane-1,2-diyl bis(4-azido-2,3,5,6-tetrafluorobenzoate). The crosslinker with two azide end groups can interlock the ligands of neighbouring quantum dots upon exposure to UV, yielding chemically robust quantum dot films. Exploiting the light-driven crosslinking process, different colour CdSe-based core-shell quantum dots can be photo-patterned; quantum dot patterns of red, green and blue primary colours with a sub-pixel size of 4 μm × 16 μm, corresponding to a resolution of >1400 pixels per inch, are demonstrated. The process is non-destructive, such that photoluminescence and electroluminescence characteristics of quantum dot films are preserved after crosslinking. We demonstrate that red crosslinked quantum dot light-emitting diodes exhibiting an external quantum efficiency as high as 14.6% can be obtained.

multidisciplinary sciences
Nondestructive Direct Patterning of Both Hole Transport and Emissive Layers for Pixelated Quantum-Dot Light-Emitting Diodes

Yuan-Qiu-Qiang Yi,Fuyan Su,Wenya Xu,Qing Zhang,Shuo Zhang,Liming Xie,Wenming Su,Zheng Cui,Christine K. Luscombe

DOI: https://doi.org/10.1021/acsnano.4c03458

IF: 17.1

2024-06-06

ACS Nano

Abstract:Considering the increasing demand for high-resolution light-emitting diodes (LEDs), it is important that direct fine patterning technologies for LEDs be developed, especially for quantum-dot LEDs (QLEDs). Traditionally, the patterning of QLEDs relies on resin-based photolithography techniques, requiring multiple steps and causing performance deterioration. Nondestructive direct patterning may provide an easy and stepwise method to achieve fine-pixelated units in QLEDs. In this study, two...

materials science, multidisciplinary,nanoscience & nanotechnology,chemistry, physical
The micropatterning of layers of colloidal quantum dots with inorganic ligands using selective wet etching

Chen Hu,Tangi Aubert,Yolanda Justo,Stijn Flamee,Marco Cirillo,Alban Gassenq,Oksana Drobchak,Filip Beunis,Günther Roelkens,Zeger Hens

DOI: https://doi.org/10.1088/0957-4484/25/17/175302

IF: 3.5

2014-04-10

Nanotechnology

Abstract:The micropatterning of layers of colloidal quantum dots (QDs) stabilized by inorganic ligands is demonstrated using PbS core and CdSe/CdS core/shell QDs. A layer-by-layer approach is used to assemble the QD films, where each cycle involves the deposition of a QD layer by dip-coating, and the replacement of the native organic ligands by inorganic moieties, such as OH(-) and S(2-), followed by a thorough cleaning of the resulting film. This results in a smooth and crack-free QD film on which a photoresist can be spun. The micropatterns are defined by a positive photoresist, followed by the removal of uncovered QDs by selective wet etching with an HCl/H3PO4 mixture. The resulting patterns can have submicron feature dimensions, limited by the resolution of the lithographic process, and can be formed on planar and 3D substrates. It is shown that the photolithography and wet etching steps have little effect on the photoluminescence quantum yield of CdSe/CdS QDs. Compared with the unpatterned CdSe/CdS QD film, only a 10% degradation in the quantum yield is observed. These results demonstrate the feasibility of the proposed micropatterning method to implement the large-scale device integration of colloidal quantum dots.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

Zhong Fu,Stefania F Musolino,Wenyue Qing,Hongjin Li,Felix J de Zwart,Zhi Zheng,Mingfeng Cai,Yun Gao,Bas de Bruin,Xingliang Dai,Jeremy E Wulff,Hao Zhang

DOI: https://doi.org/10.1021/jacs.4c09209

2024-10-23

Abstract:Colloidal quantum dots (QDs) with a wide color gamut and high luminescent efficiency are promising for next-generation electronic and photonic devices. However, precise and scalable patterning of QDs without degrading their properties and their integration into commercially relevant devices, such as digitally addressable QD light-emitting diode (QLED) displays, remain challenging. Here, we develop electronically optimized diazirine-based cross-linkers for nondestructive, direct photopatterning of QDs and, ultimately, building the active-matrix QLED displays. The key to the cross-linker design is the introduction of electron-donating substituents that permit the formation of ground-state singlet carbenes for air-stable and benign QD photopatterning. Under ambient conditions, these cross-linkers enable the patterning of heavy metal-free QDs at a resolution of over 13,000 pixels per inch using commercial i-line photolithography. The patterned QD layers fully preserved their optical and optoelectronic properties. Pixelated electroluminescent devices with patterned InP/ZnSe/ZnS QD layers show a peak external quantum efficiency of 15.3% and a maximum luminance of about 40,000 cd m-2, outperforming those made by existing QD patterning approaches. We further show the seamless integration of patterned QLEDs with thin-film transistor circuits and the fabrication of dual-color active-matrix displays. These results underscore the importance of designing photochemistry for QD patterning, and promise the implementation of direct photopatterning methods in manufacturing commercial QLED displays and other integrated QD device platforms.
Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Joon Yup Lee,Eun A Kim,Jisu Han,Yeong‐Ho Choi,Donghyo Hahm,Chi Jung Kang,Wan Ki Bae,Jaehoon Lim,Seong‐Yong Cho

DOI: https://doi.org/10.1002/admi.202200835

IF: 5.4

2022-07-19

Advanced Materials Interfaces

Abstract:Nondestructive and direct photolithography‐based quantum dot (QD) film patterning is successfully done by employing a sulfonic group‐free photoresist. Previously, Cd‐based QD film is patterned by typical photolithography, but InP‐based QD film shows significant photoluminescence (PL) quenching during the patterning process. PL intensity of atomic layer deposited ZnO‐coated QD film is not significantly affected when the photoresist is coated. Colloidal quantum dot‐based light‐emitting diodes (QD‐LEDs) are one of the potential future self‐emissive displays owing to their large‐scale solution‐processibility and high color purity. For the industrial application of QD‐LEDs, high‐performance QD‐LED and high‐resolution patterning of quantum dot (QD) films are required. Photolithography is an ideal tool for patterning QD films. Previously, the high‐resolution patterning of QD films using direct photolithography by ultra‐thin atomic layer deposition of ZnO on the QD surface is reported. The patterning process is acceptable for Cd‐based QD films, but the photoresist severely deteriorates the photoluminescence (PL) intensity of InP‐based QD films owing to the presence of sulfonic groups in the photoactive compound. Herein, a non‐destructive direct photolithography process for QD film patterning using a negative photoresist that does not affect the PL intensities of Cd‐ and InP‐based QD films is reported. The effect of the photoresist is also verified by a PL lifetime study. Extremely bright Cd‐ and InP‐based QD films are successfully patterned using a softer photoresist, and micropatterning of InP‐based QD films is reported for the first time in this work using photolithography. A QD electroluminescence device is also successfully fabricated using the patterning method.

materials science, multidisciplinary,chemistry
Direct Photolithography Patterning of Quantum Dot‐Polymer

Weishu Guo,Jun Chen,Teng Ma,Ziyi Chen,Mulin Li,Haibo Zeng,Jian Lu

DOI: https://doi.org/10.1002/adfm.202310338

IF: 19

2023-11-25

Advanced Functional Materials

Abstract:QD‐Polymer composites for direct photolithography are of great significance to the development of today's display technology. This review presents representative design strategies for QD‐Polymer that can be used for direct photolithography and the development of the direct photolithography process for de‐photomasking, which provides guidance for advancing QD‐Polymer for high‐quality patterning and display applications. For the new display technology based on quantum dots (QDs), achieving high‐precision red, green, and blue pixel arrays has always been a research focus in the pursuit of high‐quality and vivid image displays. However, problems such as material stability and process environment make it difficult to guarantee the quality of high‐precision patterns. The new optical patterning technology represented by direct photolithography is considered a highly promising method for achieving ultrafine patterns at the submicron level. This process prepares patterned quantum dot‐polymer films through light‐induced chemical changes. This paper reviews the progress of direct photolithography research focused on QD‐polymer materials and presents recent advances in such processes for monochromatic/multicolor light patterning. The article classifies QD‐polymers into three categories by combining QDs with polymers in different ways, including polymer‐coated QDs, polymers as QD ligands, and polymers as photocrosslinkers for QDs. Their synthesis schemes, functional features, and challenges are also presented. In addition, a scheme to remove the photomask during direct lithography using lasers and light field modulation is also proposed. It aims to provide readers and researchers with some generalized research information and improvement ideas. This can further advance the development of direct photolithography for QD‐polymers.

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning

Hongjin Gao,Yuan Qie,Haobing Zhao,Fushan Li,Tailiang Guo,Hailong Hu

DOI: https://doi.org/10.1016/j.orgel.2022.106609

IF: 3.868

2022-09-01

Organic Electronics

Abstract:We report here high-efficiency, high-resolution quantum dot (QD) light-emitting diodes patterned by ultraviolet-induced ligand exchange. A ligand passivation strategy is carried out to remove the surface defects of QDs after patterning, and thus the device efficiency shows more than 3-fold increase. Moreover, in order to reduce the leakage current occurring in the non-luminance area between QD arrays, a polymethyl methacrylate film is inserted as a charge barrier layer to separate the hole- and electron-transport layers from direct contact. As a result, the leakage current of the devices is effectively decreased. By optimizing the ligand passivation and synergistically suppressing the leakage current, the device with 5-μm diameter QD arrays exhibits luminance over 125000 cd/m2 and maximum external quantum efficiency of 10.5%. This work provides a feasible way to achieving high resolution, high-performance quantum dot light-emitting diodes for next-generation display applications.
Quantum Dot Patterning and Encapsulation by Maskless Lithography for Display Technologies.

R. Ozdemir,Onur Erdem,Z. Hens,Hannes van Avermaet,Pieter Schiettecatte,T. Aubert

DOI: https://doi.org/10.1021/acsami.2c20982

2023-02-09

Abstract:For their unique optical properties, quantum dots (QDs) have been extensively used as light emitters in a number of photonic and optoelectronic applications. They even met commercialization success through their implementation in high-end displays with unmatched brightness and color rendering. For such applications, however, QDs must be shielded from oxygen and water vapor, which are known to degrade their optical properties over time. Even with highly qualitative QDs, this can only be achieved through their encapsulation between barrier layers. With the emergence of mini- and microLED for higher contrast and miniaturized displays, new strategies must be found for the concomitant patterning and encapsulation of QDs, with sub-millimeter resolution. To this end, we developed a new approach for the direct patterning of QDs through maskless lithography. By combining QDs in photopolymerizable resins with digital light processing (DLP) projectors, we developed a versatile and massively parallel fabrication process for the additive manufacturing of functional structures that we refer to as QD pockets. These 3D heterostructures are designed to provide isotropic encapsulation of the QDs, and hence prevent edge ingress from the lateral sides of QD films, which remains a shortcoming of the current technologies.

Materials Science,Medicine,Physics,Engineering
High-resolution in situ patterning of perovskite quantum dots via femtosecond laser direct writing

Shu-Yu Liang,Yue-Feng Liu,Shen-Yuan Wang,Hong Xia,Hong-Bo Sun

DOI: https://doi.org/10.1039/d1nr07516k

IF: 6.7

2022-01-01

Nanoscale

Abstract:Perovskite quantum dots (PQDs) have exhibited great potential for optoelectronic applications. Here, a femtosecond laser direct writing strategy was demonstrated for the in-situ fabrication of high-resolution patterned PQDs.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
Quantum Dots Synthesis Through Direct Laser Patterning: A Review

Francesco Antolini,Leonardo Orazi

DOI: https://doi.org/10.3389/fchem.2019.00252

IF: 5.5

2019-04-17

Frontiers in Chemistry

Abstract:In this brief review the advances on Direct Laser Patterning (DLP) for the synthesis of photo-luminescent semiconductor quantum dots (QDs) belonging to II-VI groups, especially in solid state using laser-assisted conversion are reported and commented. The chemistry of the precursor synthesis is illustrated because it is a crucial step for the development of the direct laser patterning of QDs. In particular, the analysis of cadmium (bis)thiolate and cadmium xanthates precursors after thermal and laser treatment is examined, with a special focus on the optical properties of the formed QDs. The second part of the review examines how the laser parameters such as the wavelength and pulse duration may regulate the properties of the patterned QDs. The DLP technique does not require complex laser systems or the use of dangerous chemical post treatments, so it can be introduced as a potential method for the patterning of pixels in quantum dot light emitting diodes (QD-LEDs) for display manufacturing.

chemistry, multidisciplinary
The Role of Liquid Ink Transport in the Direct Placement of Quantum Dot Emitters Onto Sub-Micrometer Antennas by Dip-Pen Nanolithography.

Farah Dawood,Jun Wang,Peter A. Schulze,Chris J. Sheehan,Matthew R. Buck,Allison M. Dennis,Somak Majumder,Sachi Krishnamurthy,Matthew Ticknor,Isabelle Staude,Igal Brener,Peter M. Goodwin,Nabil A. Amro,Jennifer A. Hollingsworth

DOI: https://doi.org/10.1002/smll.201801503

IF: 13.3

2018-01-01

Small

Abstract:Dip-pen nanolithography (DPN) is used to precisely position core/thick-shell ("giant") quantum dots (gQDs; ≥10 nm in diameter) exclusively on top of silicon nanodisk antennas (≈500 nm diameter pillars with a height of ≈200 nm), resulting in periodic arrays of hybrid nanostructures and demonstrating a facile integration strategy toward next-generation quantum light sources. A three-step reading-inking-writing approach is employed, where atomic force microscopy (AFM) images of the pre-patterned substrate topography are used as maps to direct accurate placement of nanocrystals. The DPN "ink" comprises gQDs suspended in a non-aqueous carrier solvent, o-dichlorobenzene. Systematic analyses of factors influencing deposition rate for this non-conventional DPN ink are described for flat substrates and used to establish the conditions required to achieve small (sub-500 nm) feature sizes, namely: dwell time, ink-substrate contact angle and ink volume. Finally, it is shown that the rate of solvent transport controls the feature size in which gQDs are found on the substrate, but also that the number and consistency of nanocrystals deposited depends on the stability of the gQD suspension. Overall, the results lay the groundwork for expanded use of nanocrystal liquid inks and DPN for fabrication of multi-component nanostructures that are challenging to create using traditional lithographic techniques.
Direct in situ photolithography of perovskite quantum dots based on photocatalysis of lead bromide complexes

Pingping Zhang,Gaoling Yang,Fei Li,Jianbing Shi,Haizheng Zhong

DOI: https://doi.org/10.1038/s41467-022-34453-9

IF: 16.6

2022-11-08

Nature Communications

Abstract:Photolithography has shown great potential in patterning solution-processed nanomaterials for integration into advanced optoelectronic devices. However, photolithography of perovskite quantum dots (PQDs) has so far been hindered by the incompatibility of perovskite with traditional optical lithography processes where lots of solvents and high-energy ultraviolet (UV) light exposure are required. Herein, we report a direct in situ photolithography technique to pattern PQDs based on the photopolymerization catalyzed by lead bromide complexes. By combining direct photolithography with in situ fabrication of PQDs, this method allows to directly photolithograph perovskite precursors, avoiding the complicated lift-off processes and the destruction of PQDs by solvents or high-energy UV light, as PQDs are produced after lithography exposure. We further demonstrate that the thiol-ene free-radical photopolymerization is catalyzed by lead bromide complexes in the perovskite precursor solution, while no external initiators or catalysts are needed. Using direct in situ photolithography, PQD patterns with high resolution up to 2450 pixels per inch (PPI), excellent fluorescence uniformity, and good stability, are successfully demonstrated. This work opens an avenue for non-destructive direct photolithography of high-efficiency light-emitting PQDs, and potentially expands their application in various integrated optoelectronic devices.

multidisciplinary sciences
High-Resolution Patterning of Perovskite Quantum Dots via Femtosecond Laser-Induced Forward Transfer

Shu-Yu Liang,Yue-Feng Liu,Zhi-Kun Ji,Shen-Yuan Wang,Hong Xia,Hong-Bo Sun

DOI: https://doi.org/10.1021/acs.nanolett.3c00006

IF: 10.8

2023-05-03

Nano Letters

Abstract:High-resolution patterning of perovskite quantum dots (PQDs) is of significant importance for satisfying various practical applications, including high-resolution displays and image sensing. However, due to the limitation of the instability of PQDs, the existing patterning strategy always involves chemical reagent treatment or mask contact that is not suitable for PQDs. Therefore, it is still a challenge to fabricate high-resolution full-color PQD arrays. Here, we present a femtosecond...

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
Direct Synthesis of Perovskite Quantum Dot Photoresist for Direct Photolithography

Gaoling Yang,Xiaochen Zhou,Zhiyuan Gao,Jianbing Shi,Tianhe Li,Shunsheng Wei,Peng Huang,Pingping Zhang

DOI: https://doi.org/10.1002/anie.202413741

2024-09-19

Angewandte Chemie International Edition

Abstract:Perovskite quantum dots (PQDs) photoresists are promising building blocks for photolithographically patterned devices. However, their complex synthesis and combination processes limit their optical properties and potential patterning applications. Here, we present an exceptionally simple strategy for the synthesis of PQDs photoresist. Unlike traditional approaches that involve centrifugation, separation, and combination processes, our direct synthesis technique using polymerizable acrylic monomer as solvent to fabricate PQDs photoresists without complex post-synthesis process. We demonstrate that the change in solubility of the precursors is the main reason for the formation of PQDs in the polymerizable monomer. By direct photolithography, colorful PQD patterns with high photoluminescence quantum yields and excellent fluorescence uniformity are successfully demonstrated. This work opens a new avenue for the direct synthesis of PQDs photoresist, expanding their applications in various integrated applications, such as photonic, energy harvesting, and optoelectronic devices.

chemistry, multidisciplinary
Quantum Dots Photoresist for Direct Photolithography Patterning

Zhiyuan Gao,Jianbing Shi,Gaoling Yang

DOI: https://doi.org/10.1002/adom.202401106

IF: 9

2024-07-07

Advanced Optical Materials

Abstract:Quantum dots (QDs) photoresist is the cornerstone of direct photolithography. This review highlights recent significant advances in the development of QDs photoresist according to their photochemical reaction during exposure. The challenges and opportunities of QDs photoresist for new display technologies are also discussed. Quantum dots (QDs) have become the most valuable luminescent materials due to their excellent optical properties, such as high color purity, high photoluminescence quantum yield (PLQY), and tunable luminescence spectra. QDs‐based display devices have been used commercially and have shown outstanding advantages such as wide color gamut, high brightness, etc. However, for high‐end displays such as micro‐light‐emitting diodes (Micro‐LED), fine precise patterning of QDs is still a prerequisite and key challenge. Recently, direct photolithography, a method based on photochemical reactions of QDs photoresist (QDPR), has been considered as the most potential patterning technology to achieve high resolution and high‐throughput. This review focuses on the recent progress of QDPR from the point of view of different photochemical reaction mechanisms: starting the monomer polymerization, followed by the ligand crosslinking or decomposition, and eventually introducing crosslinking additives. Furthermore, a comprehensive overview of the current applications of QDPR in displays is provided based on the different types of LED devices. Finally, existing problems in QDs direct photolithography are discussed, along with possible reasons and solutions. This review is expected to accelerate the development of direct photolithography patterning method and provide general guidance for the further design of QDPR for high‐end displays.

materials science, multidisciplinary,optics

Quantum dot patterning by direct photolithography

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Optical Patterning: Direct Optical Patterning of Quantum Dot Light‐Emitting Diodes via In Situ Ligand Exchange (Adv. Mater. 46/2020)

Photolithographic Patterning of Organic Color-Centers.

Photosensitizer-assisted Direct 2D Patterning and 3D Printing of Colloidal Quantum Dots

High-resolution patterning of colloidal quantum dots via non-destructive, light-driven ligand crosslinking

Nondestructive Direct Patterning of Both Hole Transport and Emissive Layers for Pixelated Quantum-Dot Light-Emitting Diodes

The micropatterning of layers of colloidal quantum dots with inorganic ligands using selective wet etching

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Direct Photolithography Patterning of Quantum Dot‐Polymer

High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning

Quantum Dot Patterning and Encapsulation by Maskless Lithography for Display Technologies.

High-resolution in situ patterning of perovskite quantum dots via femtosecond laser direct writing

Quantum Dots Synthesis Through Direct Laser Patterning: A Review

The Role of Liquid Ink Transport in the Direct Placement of Quantum Dot Emitters Onto Sub-Micrometer Antennas by Dip-Pen Nanolithography.

Direct in situ photolithography of perovskite quantum dots based on photocatalysis of lead bromide complexes

High-Resolution Patterning of Perovskite Quantum Dots via Femtosecond Laser-Induced Forward Transfer

Direct Synthesis of Perovskite Quantum Dot Photoresist for Direct Photolithography

Quantum Dots Photoresist for Direct Photolithography Patterning