Abstract:This paper demonstrates that the molecular conformation (in addition to the composition and structure) of molecules making up self-assembled monolayers (SAMs) influences the rates of charge tunneling (CT) through them, in molecular junctions of the form AuTS/S(CH2)2CONR1R2//Ga2O3/EGaIn, where R1 and R2 are alkyl chains of different length. The lengths of chains R1 and R2 were selected to influence the conformations and conformational homogeneity of the molecules in the monolayer. The conformations of the molecules influence the thickness of the monolayer (i.e. tunneling barrier width) and their rectification ratios at ±1.0 V. When R1 = H, the molecules are well ordered and exist predominantly in trans-extended conformations. When R1 is an alkyl group (e.g., R1 ≠ H), however, their conformations can no longer be all-trans-extended, and the molecules adopt more gauche dihedral angles. This change in the type of conformation decreases the conformational order and influences the rates of tunneling. When R1 = R2, the rates of CT decrease (up to 6.3×), relative to rates of CT observed through SAMs having the same total chain lengths, or thicknesses, when R1 = H. When R1 ≠ H ≠ R2, there is a weaker correlation (relative to that when R1 = H or R1 = R2) between current density and chain length or monolayer thickness, and in some cases the rates of CT through SAMs made from molecules with different R2 groups are different, even when the thicknesses of the SAMs (as determined by XPS) are the same. These results indicate that the thickness of a monolayer composed of insulating, amide-containing alkanethiols does not solely determine the rate of CT, and rates of charge tunneling are influenced by the conformation of the molecules making up the junction.

Formation of Nanopatterns of a Self-Assembled Monolayer (SAM) Within a SAM of Different Molecules Using a Current Sensing Atomic Force Microscope

A Novel Nanolithography Technique for Self-Assembled Monolayers Using a Current Sensing Atomic Force Microscope

Electrochemical Studies on Self-Assembled Monolayer (sam) Upon Exposure to Anionic Surfactants: Pfoa, Pfos, Sds and Sdbs

Patterning of Supported Gold Monolayers Via Chemical Lift-off Lithography

AFM-Assisted Fabrication of Thiol SAM Pattern with Alternating Quantified Surface Potential

Study of the Transport Properties of Self-Assembled Alkanethiol Monolayer by Conduction Atomic Force Microscopy

The nature of alkanethiol self-assembled monolayer adsorption on sputtered gold substrates

Fabrication of Patterned Self-Assembled Monolayers on Silicon Substrate

In situ differential atomic force microscopy (AFM) measurement for ultra-thin Thiol SAM patterns by area-selective deposition technique

Supramolecular structure of self-assembled monolayers of ferrocenyl terminated n-alkanethiolates on gold surfaces.

Conformation, and Charge Tunneling Through Molecules in SAMs

Photopatterning of self-assembled monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

STM Imaging Mechanism for Alkanethiol Self-Assembly Monolayers on Au(111)

Monitoring the Electrochemical Transformation of an Azobenzene-Terminated Alkanethiolate Monolayer at Gold by Chemical Force Microscopy

First-principles simulation of scanning tunneling microscopy images of individual molecules in alkanethiol self-assembled monolayers on Au(111)

Atomic Force Microscopy of Azobenzene-Derived Alkanethiolate Monolayers on Gold

Electron Transfer Through Organic Monolayers Directly Bonded to Silicon Probed by Current Sensing Atomic Force Microscopy: Effect of Chain Length and Applied Force

Self-assembled Monolayers of New Dendron-Thiols: Manipulation of the Patterned Surface and Wetting Properties

Patterning Of Self-Assembled Monolayers By Phase-Shifting Mask And Its Applications In Large-Scale Assembly Of Nanowires

Investigation into Self-Assembled Monolayers of a Polyether Dendron Thiol: Chemisorption, Kinetics, and Patterned Surface