Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

Understanding the effect of HF-based wet shallow etching on optical performance of reactive-ion-etched fused silica optics

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Effect of HF etching on the surface quality and laser-induced damage of fused silica

Experimental study on HF etching of fused silica

The Influence of Etching Depth on Surface Molecular Structures and Laser Damage Thresholds of Fused Silica by using Megasonic-assisted HF-based Etching

The Effect of HF Etching on the Surface Quality and Figure of Fused Silica Optics

KOH-based shallow etching for exposing subsurface damage and increasing laser damage resistance of fused silica optical surface

Experimental Study on Evolution of Chemical Structure Defects and Secondary Contaminative Deposition during HF-Based Etching

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Improve the Laser Damage Resistance of Fused Silica by Wet Surface Cleaning and Optimized HF Etch Process

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

The Infrared Spectra and Laser Damage Threshold of the Fused Silica after Megacoustic Field Assisted Hydrofluoric-Based Etching

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Effect on Nanoscale Damage Precursors of Fused Silica with Wet Etching in KOH Solutions

Combined Technique of Elastic Magnetorheological Finishing and HF Etching for High-Efficiency Improving of the Laser-Induced Damage Threshold of Fused Silica Optics.

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics

Effects of Acid-Etching Depth on 355 Nm Laser-Induced Damage Threshold of Fused Silica

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica