Abstract:The damage repair of fused silica based on the CO2 laser repair technique has been successfully applied in high-power laser systems in the controllable nuclear fusion field. However, this kind of repairing technique mainly focuses on large-scale laser damage with sizes larger than 200 μm, but ignores the influence of cluster small-scale damage with sizes smaller than 50 μm. In order to inhibit the growth of small-scale damage and further improve the effect of fused silica damage repair, this paper carried out a study on the repair of fused silica damage using the magnetorheological (MR) removing method. The feasibility of fused silica damage repairing was verified, and the evolution law of the number, morphology, and the surface roughness of small-scale damage were all analyzed. The results showed that the MR removing method was non-destructive compared to traditional repairing technologies. It not only effectively improved the whole damage repairing rate to more than 90%, but it also restored the optical properties and surface roughness of the damaged components in the repairing process. Based on the study of the MR removing repair law, a combined repairing process of 4 μm MR removal and 700 nm computer controlled optical surfacing (CCOS) removal is proposed. A typical fused silica element was experimentally repaired to verify the process parameters. The repairing rate of small-scale damage was up to 90.4%, and the surface roughness was restored to the level before repairing. The experimental results validate the effectiveness and feasibility of the combined repairing process. This work provides an effective method for the small-scale damage repairing of fused silica components.

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics

Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics

Research on the mitigation of redeposition defects on the fused silica surface during wet etching process

KOH-based shallow etching for exposing subsurface damage and increasing laser damage resistance of fused silica optical surface

Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

Effect of ion beam etching on surface/subsurface structural defect evolution in fused silica optics

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Experimental Study on Evolution of Chemical Structure Defects and Secondary Contaminative Deposition during HF-Based Etching

The influence of chemical etching on the surface quality of phase components

Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment

Understanding the effect of HF-based wet shallow etching on optical performance of reactive-ion-etched fused silica optics

Morphology evolution mechanisms and localized structural modification of repaired sites on fused silica optics processed by CO2 laser rapid ablation mitigation

Research on Laser-Induced Damage Post-Restoration Morphology of Fused Silica and Optimization of Patterned CO2 Laser Repair Strategy

Laser field manipulation and laser damage resistance property of nanotextures on fused silica optics

Combining laser-induced fluorescence and light-scattering microscopies to diagnose low-fluence damage precursors on KDP-based crystal surface

Effect of Different Etching Processes on Surface Defects of Quartz Crystals

Material migration and damage characteristics of fused silica optical surface treated by CO 2 laser/short – pulse ultraviolet laser

Dual-control of incubation effect for efficiently fabricating surface structures in fused silica

Rapid and Non-Destructive Repair of Fused Silica with Cluster Damage by Magnetorheological Removing Method