Abstract:Ultraviolet (UV) laser-induced damage from defects and impurities in conventional ground and polished fused silica optics significantly hinders their application in high-power laser systems. Laser cleaning, as a non-contact and polishing fluid-free technology, is likely to be a key technology for improving the damage performance of fused silica optics. However, conventional laser cleaning primarily focuses on surface pollution without removing the material. It overlooks the detrimental effects of multiscale defects and impurities inside the fused silica. In this study, microsecond-pulsed CO2 laser cleaning was proposed to enhance the laser-induced damage threshold (LIDT) by ablating fused silica to nanometer depths. Through multiple-scale simulations, the thermal stress evolution and modulation mechanism of defects and impurities on the damage performance (ranging from the macro- to nanoscale) were revealed. Utilizing multimodal characterization, laser cleaning effectively eliminated and suppressed surface/subsurface defects, absorptive defects, chemical structural defects, and elemental impurities without introducing residual thermal stress and destroying surface roughness. In addition, the evolution of the molecular structures indicated a tendency for intrinsic defects to recombine into shorter-ring structures, which resulted in a densified fused silica surface. The laser-cleaned samples exhibited higher damage thresholds, achieving 47.6 % (0 % probability) and 27.0 % (100 % probability) improvements compared with uncleaned samples. This technology provides a new method for fabricating high damage threshold fused silica optics with superior surface quality for high-power laser applications.

Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Effect of ion beam etching on surface/subsurface structural defect evolution in fused silica optics

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Anisotropic Ion Beam Etching Of Fused Silica To Mitigate Subsurface Damage

Effects Of Ion Beam Etching On The Nanoscale Damage Precursor Evolution Of Fused Silica

Layer by layer exposure of subsurface defects and laser-induced damage mechanism of fused silica

Detailed Near-Surface Nanoscale Damage Precursor Measurement and Characterization of Fused Silica Optics Assisted by Ion Beam Etching

Investigation of Laser-Induced Damage Threshold Improvement Mechanism During Ion Beam Sputtering of Fused Silica

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Recovery of fused silica surface damage resistance by ion beam etching

Improve the Laser Damage Resistance of Fused Silica by Wet Surface Cleaning and Optimized HF Etch Process

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Investigation of Grinding and Lapping Surface Damage Evolution of Fused Silica by Inductively Coupled Plasma Etching

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics

Microsecond-pulsed CO2 laser cleaning of high damage threshold fused silica

Investigation of surface characteristics evolution and laser damage performance of fused silica during ion-beam sputtering