Abstract:Fused silica is widely used in aerospace and precision integrated micro-optical sensors due to its high hardness, low coefficient of thermal expansion, high transmittance properties and high chemical stability in harsh environments. Due to the amorphous characteristics, fused silica wet etching is isotropic and cannot realize specific structural functional devices; dry etching process is complex, costly, and relatively low productivity. These characteristics make the processing of fused silica extremely difficult, with high cost and low yield. Femtosecond laser processing has been widely used in the processing of complex and fine three-dimensional structure of fused silica due to its wide adaptability of materials, high degree of processing fineness and non-mask processing technology, but the surface of the processed surface is relatively rough. Fine micro-optical devices can be realized by wet-assisted femtosecond laser processing. In this study, microstructural patterns were fabricated on fused silica using a tightly focused femtosecond laser by means of a self-developed ultrafast laser processing instrumentation. By controlling the laser processing parameters and the etching time of HF solution to realize the precise modulation of linewidth, period and height of the grating, one/two dimensional gratings, and the Fresnel zone plates with circular and elliptical focal points and the biomimetic compound eye microlens array were successfully fabricated. Finally, the performance of the fabricated optical components were characterized, which were comparable to theoretical simulation values. The results show that the total diffraction efficiency of the fused silica gratings fabricated using this method reaches 85.5%; the Fresnel zone plates and the bionic compound eye microlens array have good focusing effects. This study provides a reference method for the fine micromachining of hard materials such as fused silica, and provides a theoretical basis for its engineering application.

Femtosecond laser modification combined with chemical etching to achieve high-quality cutting of millimeter-thick fused silica

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Research of Femtosecond Laser-Assisted Etching of Fused Silica Micro-Optics Devices

Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

High-throughput Microchannel Fabrication in Fused Silica by Temporally Shaped Femtosecond Laser Bessel-beam-assisted Chemical Etching.

Experimental Investigation on Laser In-Situ Assisted Ultra-Precision Cutting of Fused Silica

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Improvement of Rear Damage of Thin Fused Silica by Liquid-Assisted Femtosecond Laser Cutting

Controlling of Surface Ablation Threshold of Fused Silica by Double-Pulsed Femtosecond Laser

Liquid-Assisted Femtosecond Laser Precision-Machining of Silica.

Research on Laser-Assisted Micro-Milling of Fused Silica

Improve the Laser Damage Resistance of Fused Silica by Wet Surface Cleaning and Optimized HF Etch Process

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Thermal analysis of in-situ laser assisted diamond cutting of fused silica and process optimization

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Experimental Investigation on Processing of Fused Silica Microchannels by High Repetition Rate Femtosecond Laser

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Micro-Channel Etching Characteristics Enhancement by Femtosecond Laser Processing High-Temperature Lattice in Fused Silica Glass

Investigation on Femtosecond Laser-Assisted Microfabrication in Silica Glasses

Investigation on femtosecond laser combined with dynamic wet etching machining of SiC/SiC

Improving the Quality of Femtosecond Laser Processing Micro-Hole Array by Coated with Aluminum Film on Fused Silica Sheet