Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

Effect of ion beam etching on surface/subsurface structural defect evolution in fused silica optics

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Anisotropic Ion Beam Etching Of Fused Silica To Mitigate Subsurface Damage

Recovery of fused silica surface damage resistance by ion beam etching

Investigation of surface characteristics evolution and laser damage performance of fused silica during ion-beam sputtering

Effects Of Ion Beam Etching On The Nanoscale Damage Precursor Evolution Of Fused Silica

Layer by layer exposure of subsurface defects and laser-induced damage mechanism of fused silica

Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Investigation of Laser-Induced Damage Threshold Improvement Mechanism During Ion Beam Sputtering of Fused Silica

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Optical characterization and laser damage of fused silica optics after ion beam sputtering

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment

Influence Mechanism of Plasma Cleaning and Ion Beam Figuring on the Intrinsic Surface of Fused Silica

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Surface Defects, Stress Evolution, and Laser Damage Enhancement Mechanism of Fused Silica under Oxygen-Enriched Condition

Effect of Different Etching Processes on Surface Defects of Quartz Crystals

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Detailed Near-Surface Nanoscale Damage Precursor Measurement and Characterization of Fused Silica Optics Assisted by Ion Beam Etching